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    High registration particles-transferring system
    2.
    发明授权
    High registration particles-transferring system 有权

    公开(公告)号：US12297538B2

    公开(公告)日：2025-05-13

    申请号：US18221302

    申请日：2023-07-12

    Applicant: Xerox Corporation

    Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

    IPC: H01L21/67 ,  B05B5/00 ,  B05D1/00 ,  B81B3/00 ,  C23C16/50 ,  H01L23/00

    Abstract: Disclosed herein are techniques for transferring particles in a pattern. In one implementation, a particle-transferring system includes a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern, and a particle transfer unit configured to remove the plurality of particles from the first surface in response to the plurality of particles being within a first gap. The system also includes a second substrate configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within a second gap. The particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of the positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.

    HIGH REGISTRATION PARTICLES-TRANSFERRING SYSTEM
    4.
    发明申请
    HIGH REGISTRATION PARTICLES-TRANSFERRING SYSTEM 审中-公开

    公开(公告)号：US20200173026A1

    公开(公告)日：2020-06-04

    申请号：US16781813

    申请日：2020-02-04

    Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

    Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

    IPC: C23C16/50 ,  H01L23/00 ,  H01L21/67

    Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

    High registration particles-transferring system
    5.
    发明授权
    High registration particles-transferring system 有权

    公开(公告)号：US10604843B2

    公开(公告)日：2020-03-31

    申请号：US15591959

    申请日：2017-05-10

    Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

    Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

    IPC: C23C16/50 ,  H01L23/00 ,  H01L21/67

    Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

    Ultra-Fine Textured Digital Lithographic Imaging Plate and Method of Manufacture
    8.
    发明申请
    Ultra-Fine Textured Digital Lithographic Imaging Plate and Method of Manufacture 有权
    超细纹理数字平版印刷成像板及其制造方法

    公开(公告)号：US20150027982A1

    公开(公告)日：2015-01-29

    申请号：US13953674

    申请日：2013-07-29

    Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

    Inventor： Timothy D. Stowe ,  Sourobh Raychaudhuri ,  Carolyn P. Moorlag ,  Michael Y. Young

    IPC: B41N10/02

    CPC classification number: B41N10/02 ,  B41C1/04 ,  B41C1/05 ,  B41C1/1033 ,  B41M1/06 ,  B41N1/003 ,  B41N1/12 ,  B41N1/22 ,  B41N10/00 ,  H01L21/31111

    Abstract: A method of forming an imaging blanket for a printing apparatus comprises preparing a support structure (e.g., mold) for receipt of a polymer blanket compound, introducing the polymer blanket compound in liquid state over the support structure, curing the polymer blanket compound to produce an imaging blanket, releasing the imaging blanket from the support structure, and etching a surface of the imaging blanket to form a texture pattern therein, the surface forming an imaging surface of said imaging blanket. An imaging surface providing desirable dampening fluid retention is provided. Wet etch, dry etch or a combination of both may be used. The polymer may be a silicone compound, may include 3 percent by weight granular material.

    Abstract translation: 形成用于印刷设备的成像覆盖层的方法包括制备用于接收聚合物覆盖层化合物的支撑结构（例如，模具），将液体状态的聚合物覆盖层化合物引入载体结构上，固化聚合物覆盖层化合物以产生 成像覆盖层，从支撑结构释放成像覆盖层，以及蚀刻成像覆盖层的表面以在其中形成纹理图案，所述表面形成所述成像覆盖层的成像表面。 提供了提供期望的润版液保留的成像表面。 可以使用湿蚀刻，干蚀刻或两者的组合。 聚合物可以是硅氧烷化合物，可以包括3重量％的颗粒材料。

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