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公开(公告)号：US20230366093A1
公开(公告)日：2023-11-16
申请号：US18221302
申请日：2023-07-12
Applicant: Xerox Corporation
Inventor： Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
CPC classification number: C23C16/50 , B81B3/0018 , H01L24/95 , H01L24/75 , H01L21/67271 , H01L21/67294 , H01L21/67282 , H01L2224/95115 , H01L2224/95145 , H01L2224/95144 , H01L2924/1434 , H01L2224/95001 , H01L2224/95101 , H01L2924/1461 , H01L2924/10253
Abstract: Disclosed herein are techniques for transferring particles in a pattern. In one implementation, a particle-transferring system includes a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern, and a particle transfer unit configured to remove the plurality of particles from the first surface in response to the plurality of particles being within a first gap. The system also includes a second substrate configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within a second gap. The particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of the positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.
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Patent Agency Ranking
公开(公告)号：US20200173026A1
公开(公告)日：2020-06-04
申请号：US16781813
申请日：2020-02-04
Applicant: Xerox Corporation , Palo Alto Research Center Incorporated
Inventor： Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
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公开(公告)号：US10604843B2
公开(公告)日：2020-03-31
申请号：US15591959
申请日：2017-05-10
Applicant: Xerox Corporation , Palo Alto Research Center Incorporated
Inventor： Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
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公开(公告)号：US11732362B2
公开(公告)日：2023-08-22
申请号：US16781813
申请日：2020-02-04
Applicant: Xerox Corporation , Palo Alto Research Center Incorporated
Inventor： Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
CPC classification number: C23C16/50 , B81B3/0018 , H01L21/67271 , H01L21/67282 , H01L21/67294 , H01L24/75 , H01L24/95 , H01L2224/95001 , H01L2224/95101 , H01L2224/95115 , H01L2224/95144 , H01L2224/95145 , H01L2924/10253 , H01L2924/1434 , H01L2924/1461
Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
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公开(公告)号：US12297538B2
公开(公告)日：2025-05-13
申请号：US18221302
申请日：2023-07-12
Applicant: Xerox Corporation
Inventor： Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
Abstract: Disclosed herein are techniques for transferring particles in a pattern. In one implementation, a particle-transferring system includes a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern, and a particle transfer unit configured to remove the plurality of particles from the first surface in response to the plurality of particles being within a first gap. The system also includes a second substrate configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within a second gap. The particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of the positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.
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公开(公告)号：US20180327905A1
公开(公告)日：2018-11-15
申请号：US15591959
申请日：2017-05-10
Applicant: Xerox Corporation , Palo Alto Research Center Incorporated
Inventor： Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
IPC: C23C16/50
CPC classification number: H01L21/67271 , H01L21/67282 , H01L21/67294 , H01L24/75 , H01L24/81 , H01L24/95
Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
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