Porous substrate and fabricating method thereof, and a fabricating method for thin film transistor

    公开(公告)号:US10361402B2

    公开(公告)日:2019-07-23

    申请号:US15328416

    申请日:2016-12-23

    Inventor: Fan Tang

    Abstract: The present application discloses a fabricating method for a thin film transistor, including steps of: S1, filling filling materials into the pores of the porous substrate to obtain a carrier substrate; S2, fabricating a flexible film layer on the carrier substrate; S3, removing the filler material; S4, fabricating an organic light emitting diode on the flexible film layer; and S5, removing the porous substrate to obtain the thin film transistor. The fabricating method of the thin film transistor according to the present application is based on a porous substrate having a microporous structure, due to the presence of microporous, the bubbles generated during the OLED fabricating process can be released to avoid the damage of the bubbles during the laser irradiation and to the deposition metal mask; and eliminating the process of removing the sacrificial layer by laser irradiation, and the heating the heating process in the conventional technology.

    OLED package structure and OLED package method

    公开(公告)号:US10224496B2

    公开(公告)日:2019-03-05

    申请号:US15510227

    申请日:2016-11-18

    Inventor: Fan Tang

    Abstract: The present application provides an OLED package structure, comprises a package unit and a flexible substrate deposited with an OLED element; the package unit comprises a first package layer, a first inorganic layer and a second package layer, which sequentially stack up on the OLED element; the first package layer comprises a first pixel region and a first pixel define region, and the film thickness of the first pixel define region gradually decreases from an edge to an interior of the first pixel define region; the second package layer comprises a second pixel region corresponding to the first pixel region and a second pixel define region corresponding to the first pixel define region, and the film thickness of the second pixel region gradually decreases from an edge to an interior of the second pixel region. The present application further provides an OLED package method.

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