公开(公告)号：US20020008872A1

公开(公告)日：2002-01-24

申请号：US09876731

申请日：2001-06-07

Applicant: Winbond Electronics Corp.

Inventor： Szetsen Steven Lee

IPC: G01J003/28

CPC classification number: G01B11/00 ,  G01J3/443

Abstract: This invention provides a method for accurately measuring a gap distance between two electrodes. According to the method, a plasma space is formed between the electrodes, across which a DC voltage is coupled. The plasma space has a reactive gas that emits a spectrum of spectral lines. The spectrum is monitored to determine at least one line distance between the spectral lines. Finally, the gap distance can be deduced according to the line distance and a specific rule.

Abstract translation: 本发明提供一种精确测量两个电极之间的间隙距离的方法。 根据该方法，在电极之间形成等离子体空间，通过该电极连接DC电压。 等离子体空间具有发射光谱线谱的反应气体。 监测光谱以确定光谱线之间的至少一行距离。 最后，可以根据行距离和具体规则推导间隙距离。

公开(公告)号：US20010007778A1

公开(公告)日：2001-07-12

申请号：US09747210

申请日：2000-12-22

Applicant: WINBOND ELECTRONICS CORP.

Inventor： Szetsen Steven Lee

IPC: H01L021/00 ,  G01R031/26 ,  H01L021/66

CPC classification number: H01L22/26 ,  H01J37/32935 ,  H01J37/32963

Abstract: The present invention provides a method of frequency modulated end-point detection. Control signals are sent to the manufacture device for performing the manufacturing process, wherein process signals are generated along with the manufacturing process. Process signals are filtered to obtain synchronization signals synchronized with the control signals. A judging standard is provided according to the synchronization signals corresponding to a specific state of the process. The synchronization signals are continuously monitored, and a process end-point is determined when the synchronization signals do not meet the judging standard.

Abstract translation: 本发明提供一种频率调制终点检测方法。 控制信号被发送到制造设备以执行制造过程，其中与制造过程一起生成过程信号。 对过程信号进行滤波以获得与控制信号同步的同步信号。 根据对应于该处理的特定状态的同步信号提供判断标准。 连续监视同步信号，当同步信号不符合判断标准时，确定处理终点。

公开(公告)号：US20040112860A1

公开(公告)日：2004-06-17

申请号：US10657247

申请日：2003-09-09

Applicant: Winbond Electronics Corp.

Inventor： Szetsen Steven Lee

IPC: H01L021/302

CPC classification number: H01J37/32082 ,  H01J37/32935 ,  H01J37/32963

Abstract: A method for detecting the end point of plasma etching process by using matrix comprises a step of detecting a beginning matrix including emitting intensities and/or other plasma parameters of at least two different plasma species during beginning etching process. Then, a step of detecting an etching matrix is performed in which the etching matrix includes emitting intensities and/or other plasma parameters of the at least two different plasma species at the etching reaction. An end point matrix is then computed by using the beginning as well as etching matrices and compared to a reference end point matrix to decide whether the end point is reached.

Abstract translation: 用于通过使用矩阵检测等离子体蚀刻工艺的终点的方法包括在开始蚀刻工艺期间检测包括发射至少两种不同等离子体物质的强度和/或其他等离子体参数的起始矩阵的步骤。 然后，执行检测蚀刻矩阵的步骤，其中蚀刻矩阵包括在蚀刻反应时发射至少两种不同等离子体物质的强度和/或其他等离子体参数。 然后通过使用开始以及蚀刻矩阵来计算终点矩阵，并与参考端点矩阵进行比较，以决定是否达到终点。