公开(公告)号：US10407821B2

公开(公告)日：2019-09-10

申请号：US14592657

申请日：2015-01-08

Applicant: WOODROW SCIENTIFIC LTD.

Inventor： John Redvers Clowes

IPC: B08B7/00 ,  D06L4/50 ,  D06F33/02 ,  D06F35/00 ,  D06F75/14 ,  D06F43/00 ,  D06F75/24 ,  D06L1/00 ,  B08B7/04 ,  D06L1/12 ,  C11D3/39 ,  C11D11/00

Abstract: A method of cleaning a substrate (16, 24, 34, 64, 71, 82, 102, 165, 171, 181, 201, 300, 310) with optical energy can comprise applying optical energy from a source of optical energy (12, 21, 31, 91, 103, 114, 121, 131, 141, 151, 164, 191, 202) to the substrate. The method can comprise applying the optical energy to a substrate having a cleaning agent applied thereto, the optical energy having one or more optical parameters selected for cleaning the substrate. The method can comprise reading data from a data bearing element (173) associated with the substrate, communicating the data to a processor (154) associated with a cleaning appliance (10, 30, 40, 60, 70, 80, 90, 110, 120, 130, 140, 150, 161, 200) comprising the source of optical energy, wherein the processor, responsive to the communicated data, controls the cleaning of the substrate with the optical energy. The method can comprise slidingly contacting the substrate with a work surface, said work surface comprising an aperture (83, 117) and emanating optical energy from the aperture for cleaning the substrate. A cleaning appliance can comprise an appliance body (80, 90, 104, 125) comprising an aperture for emanating optical energy for cleaning the substrate and an optical transmission pathway arranged for propagating optical energy received from an optical energy source to said aperture. The appliance can be adapted and constructed for delivering a cleaning agent to the substrate. The appliance can include a processor, a data interface in communication with the processor, and can be configured such that the processor outputs signals that control the cleaning of the substrate, the processor being configured for controlling, responsive to data received by the data interface and via the output signals, the substrate cleaning. The cleaning appliance can include a suction pump (142) for removing material from the substrate.

公开(公告)号：US10968562B2

公开(公告)日：2021-04-06

申请号：US16501600

申请日：2019-05-06

Applicant: WOODROW SCIENTIFIC LTD.

Inventor： John Redvers Clowes

IPC: D06M10/00 ,  D06F75/08 ,  D06F75/02 ,  D06F75/22 ,  D06F75/20 ,  B23K26/00 ,  B23K26/082 ,  D06L4/00 ,  B08B7/00 ,  D06F75/14 ,  D06F75/00 ,  B23K26/352 ,  B23K101/34 ,  B23K103/00 ,  B23K26/0622 ,  B23K26/03 ,  B23K26/06 ,  B23K26/073 ,  B23K26/354

Abstract: Disclosed are methods and apparatus for cleaning a substrate, such as a fabric material, involving the application of optical energy to the substrate, typically in the form of a beam of light, where the energy of the beam causes removal of the contaminant from substrate, such as from the fibres of a fabric material. The cleaning may occur via any mechanism, including one or more of, alone or in any combination, ablation, melting, heating or reaction with the substrate or contaminant or agent introduced to aid in the cleaning. The optical energy is typically applied to a selected area of the substrate (e.g., as a beam), and the substrate and beam or optical energy source moved relative to one another so as to clean a larger area of the substrate, either by moving the substrate or the beam, or both. Movement of the beam with respect to the substrate can be attained through a beam scanning mechanism or through movement of the optical source itself.

公开(公告)号：US20150225891A1

公开(公告)日：2015-08-13

申请号：US14592657

申请日：2015-01-08

Applicant: WOODROW SCIENTIFIC LTD.

Inventor： John Redvers Clowes

IPC: D06M10/00 ,  D06L3/00 ,  D06F75/14 ,  B08B7/00

CPC classification number: D06F75/14 ,  B08B7/0035 ,  B08B7/0042 ,  C11D3/3947 ,  C11D11/007 ,  D06F33/02 ,  D06F35/00 ,  D06F43/002 ,  D06F75/246 ,  D06F2202/10 ,  D06L1/00 ,  D06L4/50

Abstract: A method of cleaning a substrate (16, 24, 34, 64, 71, 82, 102, 165, 171, 181, 201, 300, 310) with optical energy can comprise applying optical energy from a source of optical energy (12, 21, 31, 91, 103, 114, 121, 131, 141, 151, 164, 191, 202) to the substrate. The method can comprise applying the optical energy to a substrate having a cleaning agent applied thereto, the optical energy having one or more optical parameters selected for cleaning the substrate. The method can comprise reading data from a data bearing element (173) associated with the substrate, communicating the data to a processor (154) associated with a cleaning appliance (10, 30, 40, 60, 70, 80, 90, 110, 120, 130, 140, 150, 161, 200) comprising the source of optical energy, wherein the processor, responsive to the communicated data, controls the cleaning of the substrate with the optical energy. The method can comprise slidingly contacting the substrate with a work surface, said work surface comprising an aperture (83, 117) and emanating optical energy from the aperture for cleaning the substrate. A cleaning appliance can comprise an appliance body (80, 90, 104, 125) comprising an aperture for emanating optical energy for cleaning the substrate and an optical transmission pathway arranged for propagating optical energy received from an optical energy source to said aperture. The appliance can be adapted and constructed for delivering a cleaning agent to the substrate. The appliance can include a processor, a data interface in communication with the processor, and can be configured such that the processor outputs signals that control the cleaning of the substrate, the processor being configured for controlling, responsive to data received by the data interface and via the output signals, the substrate cleaning. The cleaning appliance can include a suction pump (142) for removing material from the substrate.

公开(公告)号：US20150218746A1

公开(公告)日：2015-08-06

申请号：US14589695

申请日：2015-01-05

Applicant: WOODROW SCIENTIFIC LTD.

Inventor： John Redvers Clowes

IPC: D06M10/00 ,  D06F75/14 ,  D06L3/00

CPC classification number: D06M10/005 ,  B08B7/0042 ,  B23K26/0006 ,  B23K26/0096 ,  B23K26/032 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/352 ,  B23K26/354 ,  B23K2101/34 ,  B23K2103/38 ,  B23K2103/40 ,  B23K2103/42 ,  B23K2103/50 ,  D06F75/00 ,  D06F75/02 ,  D06F75/08 ,  D06F75/14 ,  D06F75/20 ,  D06F75/22 ,  D06L4/00

Abstract: Disclosed are methods and apparatus for cleaning a substrate, such as a fabric material, involving the application of optical energy to the substrate, typically in the form of a beam of light, where the energy of the beam causes removal of the contaminant from substrate, such as from the fibres of a fabric material. The cleaning may occur via any mechanism, including one or more of, alone or in any combination, ablation, melting, heating or reaction with the substrate or contaminant or agent introduced to aid in the cleaning. The optical energy is typically applied to a selected area of the substrate (e.g., as a beam), and the substrate and beam or optical energy source moved relative to one another so as to clean a larger area of the substrate, either by moving the substrate or the beam, or both. Movement of the beam with respect to the substrate can be attained through a beam scanning mechanism or through movement of the optical source itself.

Abstract translation: 公开了用于清洁基底（例如织物材料）的方法和装置，其涉及通常以光束的形式将光能施加到基底，其中光束的能量引起从基底去除污染物， 例如来自织物材料的纤维。 清洁可以通过任何机制，包括单独或以任何组合的一种或多种方法进行，所述机构可以与引入以帮助清洁的底物或污染物或试剂进行消融，熔化，加热或反应。 光能通常被施加到衬底的选定区域（例如，作为光束），并且衬底和光束或光能源相对于彼此移动，以便清洁衬底的较大面积，无论是通过移动 衬底或光束，或两者。 可以通过光束扫描机构或通过光源本身的移动来实现光束相对于衬底的移动。

公开(公告)号：US10280558B2

公开(公告)日：2019-05-07

申请号：US14589695

申请日：2015-01-05

Applicant: WOODROW SCIENTIFIC LTD.

Inventor： John Redvers Clowes

IPC: D06F75/00 ,  D06F75/02 ,  D06F75/08 ,  D06F75/22 ,  B08B7/00 ,  D06M10/00 ,  D06F75/20 ,  B23K26/00 ,  D06F75/14 ,  B23K26/03 ,  B23K26/06 ,  B23K26/073 ,  B23K26/082 ,  B23K26/0622 ,  D06L4/00 ,  B23K26/354 ,  B23K26/352 ,  B23K101/34 ,  B23K103/00

Abstract: Disclosed are methods and apparatus for cleaning a substrate, such as a fabric material, involving the application of optical energy to the substrate, typically in the form of a beam of light, where the energy of the beam causes removal of the contaminant from substrate, such as from the fibers of a fabric material. The cleaning may occur via any mechanism, including one or more of, alone or in any combination, ablation, melting, heating or reaction with the substrate or contaminant or agent introduced to aid in the cleaning. The optical energy is typically applied to a selected area of the substrate (e.g., as a beam), and the substrate and beam or optical energy source moved relative to one another so as to clean a larger area of the substrate, either by moving the substrate or the beam, or both. Movement of the beam with respect to the substrate can be attained through a beam scanning mechanism or through movement of the optical source itself.