Imaging devices with dummy patterns

    公开(公告)号:US10249661B2

    公开(公告)日:2019-04-02

    申请号:US14466412

    申请日:2014-08-22

    Inventor: Ho-Tai Lin

    Abstract: An imaging device is provided. The imaging device includes a plurality of photoelectric conversion elements formed on a substrate in an active area. A microlens structure is disposed above the photoelectric conversion elements. A dummy pattern having a plurality of protruding elements is disposed above the substrate in a peripheral area surrounding the active area. Furthermore, a passivation film is conformally formed on the microlens structure and the dummy pattern. The passivation film on the tops of the protruding elements of the dummy pattern has a surface area smaller than a surface area of the peripheral area outside of the microlens structure.

    Optical sensors and methods for forming the same

    公开(公告)号:US10770496B2

    公开(公告)日:2020-09-08

    申请号:US15953837

    申请日:2018-04-16

    Abstract: An optical sensor includes an optical layer disposed on a substrate, and a light shielding layer disposed on the optical layer, wherein the light shielding layer includes a first opening that partially exposes the optical layer. The optical sensor also includes a polymer material layer that fills the first opening, wherein a top surface of the polymer material layer is higher than a top surface of the light shielding layer. The optical sensor further includes an adhesive layer disposed on the light shielding layer and the polymer material layer, and a surface component disposed on the adhesive layer.

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