GAS INJECTION SYSTEM FOR ION BEAM DEVICE
    1.
    发明申请
    GAS INJECTION SYSTEM FOR ION BEAM DEVICE 审中-公开
    离子束装置气体注入系统

    公开(公告)号:US20170062185A1

    公开(公告)日:2017-03-02

    申请号:US14840531

    申请日:2015-08-31

    IPC分类号: H01J37/32

    摘要: A gas injection system for an ion beam device, the gas injection system including an extraction plate, an extraction aperture formed in the extraction plate for allowing passage of an ion beam, a first gas distributor removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein, a second gas distributor removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein, a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold, and a residue removal gas source connected to the gas manifold.

    摘要翻译: 一种用于离子束装置的气体注入系统,所述气体注入系统包括提取板,形成在所述提取板中用于允许离子束通过的提取孔,在所述提取板的第一侧上可移除地紧固到所述提取板的第一气体分配器 所述提取孔,所述第一气体分配器具有形成在其中的气体孔口;第二气体分配器,其在所述提取孔的与所述第一侧相对的第二侧上可拆卸地紧固到所述提取板,所述第二气体分配器具有形成在其中的气体孔口; 第一气体管道,其延伸穿过第一气体分配器和安装到提取板的气体歧管之间的提取板,以及第二气体导管,其延伸穿过第二气体分配器之间的提取板,气体歧管和残留物去除气体源连接到 气体歧管。