公开(公告)号：US20230408034A1

公开(公告)日：2023-12-21

申请号：US18245341

申请日：2021-09-16

Applicant: VERSUM MATERIALS US, LLC

Inventor： WILLIAM THOMAS PILTZ ,  CYNTHIA LEE HUGHES ,  JOHN PAUL PREGO ,  SHAWN S. CABLE ,  SANG-JAE YIM ,  ANTHONY JOHN SMITH ,  JIHOON KIM ,  SANG-KEUN LEE ,  YONG-TAE KIM ,  TAE-UG KANG ,  HO-SAN KWON ,  SUNG-UP JANG ,  YOUNG-SOO CHOI ,  HYO-JONG HWANG ,  BANG-YEON YU

IPC: F17C5/06

CPC classification number: F17C5/06 ,  F17C2205/0134 ,  F17C2205/0338 ,  F17C2250/0626 ,  F17C2270/0518

Abstract: A supply control system for a tank utilized in a semiconductor manufacturing process is disclosed. The supply control system for the tank according to an embodiment of the present disclosure includes a plurality of tanks for storing a large amount of process material used to manufacture a semiconductor; a main-supply pipe configured to communicate with sub-supply pipes respectively coupled to the plurality of tanks and to supply process material to a semiconductor manufacturing device; a plurality of flow control devices respectively included in the sub-supply pipes and configured to control a process material flow rate discharged from each of the plurality of tanks; a sensor included in the main-supply pipe and configured to measure in real time the process material flow rate and a process material supply pressure supplied from each of the plurality of tanks to the semiconductor manufacturing device; a back-up portion coupled to the main-supply pipe and configured to supplementally discharge stored process material, such that process material is stably supplied to the semiconductor manufacturing device; and a controller configured to control the plurality of flow control devices and the back-up portion based on information on the process material flow rate or information on the process material supply pressure measured by the sensor, such that a set process material flow rate is supplied to the semiconductor manufacturing device through the main-supply pipe.