TRENCH MOSFET DEVICE WITH PROTECTION GATE STRUCTURE AND A METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20250072021A1

    公开(公告)日:2025-02-27

    申请号:US18237034

    申请日:2023-08-23

    Inventor: Wai Tien CHAN

    Abstract: A silicon carbide MOSFET device which contains a N-Channel MOSFET, and a JFET connected to the N-Channel MOSFET such that their drain-source current paths are connected in series. A gate of the JFET is connected to a gate of the N-Channel MOSFET device via a voltage divider, which is formed monolithically with the silicon carbide substrate and the first to fourth silicon carbide layers. The protection gate structure can shield the trench oxide from high drain voltage during off-state. The voltage divider is configured to restrict a gate voltage of the JFET such that a SiC PN diode formed within the silicon carbide MOSFET device is turned off when the N-Channel MOSFET is on or off.

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