公开(公告)号：US11542602B2

公开(公告)日：2023-01-03

申请号：US16938468

申请日：2020-07-24

Applicant: Tokyo Electron Limited

Inventor： Yoshitaka Miura

IPC: C23C16/455 ,  C23C16/56 ,  C23C16/44 ,  H01J23/10 ,  H01L21/67 ,  B24B57/02

Abstract: A substrate processing apparatus includes: a processing container; an injector provided inside the processing container and having a shape extending in a longitudinal direction along which a processing gas is supplied; a holder fixed to the injector; a first magnet fixed to the holder and disposed inside the processing container; a second magnet separated from the first magnet by a partition plate and disposed outside the processing container; and a driving part configured to rotate the second magnet, wherein the first magnet and the second magnet are magnetically coupled to each other, and wherein by rotating the second magnet by the driving part, the first magnet magnetically coupled to the second magnet is rotated, and the injector rotates about the longitudinal direction as an axis.

公开(公告)号：US11913115B2

公开(公告)日：2024-02-27

申请号：US16928740

申请日：2020-07-14

Applicant: Tokyo Electron Limited

Inventor： Yoshitaka Miura

IPC: C23C16/52 ,  C23C16/455 ,  C23C16/458 ,  C23C16/44

CPC classification number: C23C16/4588 ,  C23C16/45544 ,  C23C16/45561 ,  C23C16/45578 ,  C23C16/52 ,  C23C16/4401 ,  C23C16/45589

Abstract: A substrate processing apparatus including: a processing container; an injector provided inside the processing container to have a shape extending in a longitudinal direction and configured to supply a processing gas; a holder fixed to the injector; a windmill fixed to the holder; a first driving-gas supply part configured to supply a driving-gas that rotates the windmill in a first direction; a second driving-gas supply part configured to supply the driving-gas that rotates the windmill in a second direction opposite the first direction; and a driving-gas controller configured to control the supply of the driving-gas from the first driving-gas supply part and the second driving-gas supply part. The injector is rotated about the longitudinal direction corresponding to a rotational axis by rotating the windmill through the supply of the driving-gas from at least one of the first and second driving-gas supply parts under the control of the driving-gas controller.

公开(公告)号：US20210023677A1

公开(公告)日：2021-01-28

申请号：US16938468

申请日：2020-07-24

Applicant: Tokyo Electron Limited

Inventor： Yoshitaka Miura

IPC: B24B57/02 ,  C23C16/56

Abstract: A substrate processing apparatus includes: a processing container; an injector provided inside the processing container and having a shape extending in a longitudinal direction along which a processing gas is supplied; a holder fixed to the injector; a first magnet fixed to the holder and disposed inside the processing container; a second magnet separated from the first magnet by a partition plate and disposed outside the processing container; and a driving part configured to rotate the second magnet, wherein the first magnet and the second magnet are magnetically coupled to each other, and wherein by rotating the second magnet by the driving part, the first magnet magnetically coupled to the second magnet is rotated, and the injector rotates about the longitudinal direction as an axis.