FABRIC SOFTENER COMPOSITIONS
    2.
    发明申请

    公开(公告)号:US20180371365A1

    公开(公告)日:2018-12-27

    申请号:US16005734

    申请日:2018-06-12

    IPC分类号: C11D3/00 C11D3/30 C11D3/32

    摘要: A fabric softener composition including (i) 2 to 50 wt % quaternary ammonium ester fabric softener compound; and (ii) an amide of formula I: R1-CO—NR2R3  (I) wherein R1 is selected from the group consisting of linear or branched, substituted or unsubstituted C6-C12, each of R2 and R3 is independently selected from H, OH, a halogen, or C1-C6 linear or branched, substituted or unsubstituted hydrocarbyl groups, and methods of treating a fabric including contacting the fabric with the composition.

    CLEANING COMPOSITION
    5.
    发明申请

    公开(公告)号:US20210054307A1

    公开(公告)日:2021-02-25

    申请号:US16994706

    申请日:2020-08-17

    摘要: An aqueous cleaning composition comprising: (a) from 0.01 to 0.5% by weight of the composition of a grease loosening system comprising: i) 50% or more by weight of the system of a low emulsifying surfactant wherein the low emulsifying surfactant is a nonionic ethoxylate having an HLB value of from about 13 to about 20; and ii) 50% or less by weight of the system of a high emulsifying material wherein the high emulsifying material is selected from the group consisting of nonionic surfactant having an HLB value of less than 13, a surfactant other than nonionic surfactants; antimicrobial quats and mixtures thereof; (b) a shine polymer comprising at least one monomer comprising a substantially planar 5-7 membered ring, said monomer preferably being selected from the group consisting of vinylpyrrolidone, vinylimidazoline, maleimide, styrene sulfonate and vinylcaprolactam; and (c) optionally a non-quaternary ammonium compound antimicrobial agent.

    ANTIMICROBIAL COMPOSITION
    10.
    发明申请

    公开(公告)号:US20220386600A1

    公开(公告)日:2022-12-08

    申请号:US17830374

    申请日:2022-06-02

    IPC分类号: A01N37/02 A01N31/02 A01N31/14

    摘要: Antimicrobial compositions and methods of use thereof are described. The antimicrobial compositions have an acid system, an anionic surfactant system and 2-phenoxyethanol and/or a fragrance. The acid system includes at least 30 wt % of octanoic acid and a secondary acid. The anionic surfactant system includes at least 60 wt % of octyl sulfate and a secondary surfactant having a moiety with a carbon chain length with at least ten carbon atoms. The antimicrobial composition has a pH of from about 1.5 to about 5 as measured at 20° C.