Graphic contour extracting method, pattern inspecting method, program and pattern inspecting system
    1.
    发明授权
    Graphic contour extracting method, pattern inspecting method, program and pattern inspecting system 失效
    图形轮廓提取方法,图案检查方法,程序和模式检查系统

    公开(公告)号:US06772089B2

    公开(公告)日:2004-08-03

    申请号:US10188889

    申请日:2002-07-05

    IPC分类号: G01B1102

    CPC分类号: G06K9/48 G06K9/6253

    摘要: A graphic contour extracting method includes: acquiring an image of a graphic form to be inspected; defining an inspection region for the image of the graphic form to be inspected by an inspection graphic form including at least one of a circle, an ellipse, a rectangle, a first rectangular graphic form, a second rectangular graphic form and a closed curved graphic form, at least one end of the first rectangular graphic form being replaced with any one of a semi-circle, a semi-ellipse and a parabola, at least one of four corners of the second rectangular graphic form being replaced with a ¼ circle or a ¼ ellipse, the closed curved graphic form being expressed by the following expression: ( x - x 0 ) 4 a 4 + ( y - y 0 ) 4 b 4 = 1 , and the inspection graphic form having an edge searching direction previously defined for at least one component thereof; and searching an edge of the graphic form to be inspected on the basis of the inspection graphic form to acquire contour information of the graphic form to be inspected.

    摘要翻译: 图形轮廓提取方法包括:获取要检查的图形的图像; 通过包括圆形,椭圆形,矩形,第一矩形图形,第二矩形图形和闭合曲线图形中的至少一个的检查图形来定义要检查的图形形状的图像的检查区域 第一矩形图形的至少一端用半圆,半椭圆和抛物线中的任一个代替,第二矩形图形的四个角中的至少一个被替换为1/4圈或 ¼椭圆形,闭合曲线图形由以下表达式表示:检查图形具有先前为其至少一个分量定义的边缘搜索方向; 并且基于检查图形来搜索图形形式的边缘以获取待检查图形的轮廓信息。

    Graphic contour extracting method, pattern inspecting method, program and pattern inspecting system

    公开(公告)号:US07321680B2

    公开(公告)日:2008-01-22

    申请号:US10807188

    申请日:2004-03-24

    IPC分类号: G06K9/36 G06K9/48 G06F19/00

    CPC分类号: G06K9/48 G06K9/6253

    摘要: A graphic contour extracting method includes: acquiring an image of a graphic form to be inspected; defining an inspection region for the image of the graphic form to be inspected by an inspection graphic form including at least one of a circle, an ellipse, a rectangle, a first rectangular graphic form, a second rectangular graphic form and a closed curved graphic form, at least one end of the first rectangular graphic form being replaced with any one of a semi-circle, a semi-ellipse and a parabola, at least one of four corners of the second rectangular graphic form being replaced with a ¼ circle or a ¼ ellipse, the closed curved graphic form being expressed by the following expression: ( x - x 0 ) 4 a 4 + ( y - y 0 ) 4 b 4 = 1 , and the inspection graphic form having an edge searching direction previously defined for at least one component thereof; and searching an edge of the graphic form to be inspected on the basis of the inspection graphic form to acquire contour information of the graphic form to be inspected.

    Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program
    6.
    发明授权
    Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program 有权
    图案形状评价装置,图案形状评价方法,半导体装置的制造方法以及程序

    公开(公告)号:US07787687B2

    公开(公告)日:2010-08-31

    申请号:US11589057

    申请日:2006-10-30

    IPC分类号: G06K9/00

    摘要: A pattern shape evaluation method includes acquiring design data accompanied by an evaluation area in which information on a particular evaluation area within a pattern of a semiconductor device is added to the design data for the pattern, acquiring an image of the pattern, generating edge data for the pattern from the image of the pattern, aligning the design data accompanied by the evaluation area with the edge data and evaluating the shape of the pattern within the evaluation area after the alignment.

    摘要翻译: 图案形状评估方法包括获取伴随有评估区域的设计数据,其中将关于半导体器件的图案内的特定评估区域的信息添加到图案的设计数据中,获取图案的图像,生成边缘数据, 来自图案的图案的图案,将伴随评估区域的设计数据与边缘数据对齐,并且在对准之后评估评估区域内的图案的形状。

    Method for measuring fine pattern, apparatus for measuring fine pattern, and record medium that can store therein program to measure fine pattern and can be read by using computer
    7.
    发明授权
    Method for measuring fine pattern, apparatus for measuring fine pattern, and record medium that can store therein program to measure fine pattern and can be read by using computer 失效
    用于测量精细图案的方法,精细图案测量装置,以及可以存储程序的记录介质,以测量精细图案并且可以通过使用计算机读取

    公开(公告)号:US06647147B1

    公开(公告)日:2003-11-11

    申请号:US09616984

    申请日:2000-07-14

    申请人: Yumiko Miyano

    发明人: Yumiko Miyano

    IPC分类号: G06K948

    摘要: This at least comprises: a first step of capturing an image of a fine pattern; a second step of extracting a contour of the fine pattern from the image; a third step of capturing a standard figure of the fine pattern; a fourth step of superimposing the standard figure on the contour by enlarging or reducing the standard figure while maintaining an aspect ratio thereof; a fifth step of extracting an intersection of the contour and the standard figure; a sixth step of extracting a differential region surrounded with the contour, the standard figure and the intersection; a seventh step of extracting a correction pattern region from the differential region; and an eighth step of measuring the correction pattern region.

    摘要翻译: 这至少包括:捕获精细图案的图像的第一步骤; 从图像中提取精细图案的轮廓的第二步骤; 捕获精细图案的标准图形的第三步骤; 通过在保持其纵横比的同时放大或缩小标准图形来将标准图形叠加在轮廓上的第四步骤; 提取轮廓和标准图的交点的第五步; 提取用轮廓包围的差分区域,标准图形和交叉点的第六步骤; 从差分区域提取校正图案区域的第七步骤; 以及测量校正图案区域的第八步骤。

    Micropattern measuring method and apparatus, and recording medium that records micropattern measuring program
    8.
    发明授权
    Micropattern measuring method and apparatus, and recording medium that records micropattern measuring program 失效
    微图案测量方法和装置,以及记录微图案测量程序的记录介质

    公开(公告)号:US06480807B1

    公开(公告)日:2002-11-12

    申请号:US09665942

    申请日:2000-09-21

    申请人: Yumiko Miyano

    发明人: Yumiko Miyano

    IPC分类号: G01B1102

    摘要: An image acquiring section acquires a pattern image of a sample. A figure creating section creates a figure, which reflects a shape of the micropattern, on the basis of the pattern image. A density distribution data acquiring section acquires density distribution data on a straight line perpendicular to a tangential line of an outline of the figure. An edge detecting section detects pattern edge coordinates from the density distribution data. A pattern shape measuring section measures a shape of the micropattern on the basis of the pattern edge coordinates.

    摘要翻译: 图像获取部获取样本的图案图像。 图形创建部分基于图案图像创建反映微图案的形状的图形。 密度分布数据获取部分获取垂直于图形轮廓的切线的直线上的密度分布数据。 边缘检测部分从密度分布数据检测图案边缘坐标。 图案形状测量部分基于图案边缘坐标测量微图案的形状。

    Alignment of semiconductor wafer patterns by corresponding edge groups
    9.
    发明授权
    Alignment of semiconductor wafer patterns by corresponding edge groups 有权
    通过相应边缘组对半导体晶片图案

    公开(公告)号:US08126257B2

    公开(公告)日:2012-02-28

    申请号:US11783729

    申请日:2007-04-11

    IPC分类号: G06K9/00

    CPC分类号: G06K9/4609

    摘要: A pattern shape evaluation method includes acquiring an image of an evaluation target pattern including a plurality of element patterns; detecting edge of the evaluation target pattern from the image; classifying the detected edge of the evaluation target pattern into a plurality of evaluation target pattern edge groups; acquiring edge of a reference pattern serving as an evaluation standard for the element patterns; classifying the edge of the reference pattern into a plurality of reference pattern edge groups; selecting a reference pattern edge group to be aligned with the edge of the evaluation target pattern from the classified reference pattern edge groups; aligning the edge of the selected reference pattern edge group with the edge of the evaluation target pattern; and evaluating the shape of the evaluation target pattern by use of the result of the alignment.

    摘要翻译: 图案形状评估方法包括获取包括多个元素图案的评估对象图案的图像; 从图像中检测评估对象图案的边缘; 将检测出的评价对象图案的边缘分类为多个评价对象图案边缘组; 获取用作元素图案的评估标准的参考图案的边缘; 将参考图案的边缘分类成多个参考图案边缘组; 从分类的参考图案边缘组中选择与评估对象图案的边缘对准的参考图案边缘组; 将所选择的参考图案边缘组的边缘与评估对象图案的边缘对齐; 以及通过使用对准的结果来评价评价对象图案的形状。

    Pattern shape evaluation apparatus, pattern shape evaluation method, semiconductor device manufacturing method, and program
    10.
    发明申请
    Pattern shape evaluation apparatus, pattern shape evaluation method, semiconductor device manufacturing method, and program 有权
    图案形状评价装置,图案形状评价方法,半导体装置制造方法和程序

    公开(公告)号:US20070280541A1

    公开(公告)日:2007-12-06

    申请号:US11783729

    申请日:2007-04-11

    IPC分类号: G06K9/48

    CPC分类号: G06K9/4609

    摘要: A pattern shape evaluation method includes acquiring an image of an evaluation target pattern including a plurality of element patterns; detecting edge of the evaluation target pattern from the image; classifying the detected edge of the evaluation target pattern into a plurality of evaluation target pattern edge groups; acquiring edge of a reference pattern serving as an evaluation standard for the element patterns; classifying the edge of the reference pattern into a plurality of reference pattern edge groups; selecting a reference pattern edge group to be aligned with the edge of the evaluation target pattern from the classified reference pattern edge groups; aligning the edge of the selected reference pattern edge group with the edge of the evaluation target pattern; and evaluating the shape of the evaluation target pattern by use of the result of the alignment.

    摘要翻译: 图案形状评估方法包括获取包括多个元素图案的评估对象图案的图像; 从图像中检测评估对象图案的边缘; 将检测出的评价对象图案的边缘分类为多个评价对象图案边缘组; 获取用作元素图案的评估标准的参考图案的边缘; 将参考图案的边缘分类成多个参考图案边缘组; 从分类的参考图案边缘组中选择与评估对象图案的边缘对准的参考图案边缘组; 将所选择的参考图案边缘组的边缘与评估对象图案的边缘对齐; 以及通过使用对准的结果来评价评价对象图案的形状。