摘要:
A graphic contour extracting method includes: acquiring an image of a graphic form to be inspected; defining an inspection region for the image of the graphic form to be inspected by an inspection graphic form including at least one of a circle, an ellipse, a rectangle, a first rectangular graphic form, a second rectangular graphic form and a closed curved graphic form, at least one end of the first rectangular graphic form being replaced with any one of a semi-circle, a semi-ellipse and a parabola, at least one of four corners of the second rectangular graphic form being replaced with a ¼ circle or a ¼ ellipse, the closed curved graphic form being expressed by the following expression: ( x - x 0 ) 4 a 4 + ( y - y 0 ) 4 b 4 = 1 , and the inspection graphic form having an edge searching direction previously defined for at least one component thereof; and searching an edge of the graphic form to be inspected on the basis of the inspection graphic form to acquire contour information of the graphic form to be inspected.
摘要:
A micropattern measuring method disclosed herein includes acquiring an image of a micropattern including plural layers; extracting a rough outline of the micropattern in the image as a sequence of points including plural points; dividing the plural points composing the sequence of points into groups; making each of the groups as each of patterns belong to any of the plural layers; and acquiring edge coordinates of a pattern to be measured from the patterns which are made to belong to the respective layers.
摘要:
A micropattern measuring method disclosed herein comprises acquiring an image of a micropattern including plural layers; extracting a rough outline of the micropattern in the image as a sequence of points including plural points; dividing the plural points composing the sequence of points into groups; making each of the groups as each of patterns belong to any of the plural layers; and acquiring edge coordinates of a pattern to be measured from the patterns which are made to belong to the respective layers.
摘要:
A micropattern measuring method discloses herein includes acquiring an image of a micropattern including plural layers; extracting a rough outline of the micropattern in the image as a sequence of points including plural points; dividing the plural points composing the sequence of points into groups; making each of the groups as each of patterns belong to any of the plural layers; and acquiring edge coordinates of a pattern to be measured from the patterns which are made to belong to the respective layers.
摘要:
A graphic contour extracting method includes: acquiring an image of a graphic form to be inspected; defining an inspection region for the image of the graphic form to be inspected by an inspection graphic form including at least one of a circle, an ellipse, a rectangle, a first rectangular graphic form, a second rectangular graphic form and a closed curved graphic form, at least one end of the first rectangular graphic form being replaced with any one of a semi-circle, a semi-ellipse and a parabola, at least one of four corners of the second rectangular graphic form being replaced with a ¼ circle or a ¼ ellipse, the closed curved graphic form being expressed by the following expression: ( x - x 0 ) 4 a 4 + ( y - y 0 ) 4 b 4 = 1 , and the inspection graphic form having an edge searching direction previously defined for at least one component thereof; and searching an edge of the graphic form to be inspected on the basis of the inspection graphic form to acquire contour information of the graphic form to be inspected.
摘要:
A pattern shape evaluation method includes acquiring design data accompanied by an evaluation area in which information on a particular evaluation area within a pattern of a semiconductor device is added to the design data for the pattern, acquiring an image of the pattern, generating edge data for the pattern from the image of the pattern, aligning the design data accompanied by the evaluation area with the edge data and evaluating the shape of the pattern within the evaluation area after the alignment.
摘要:
This at least comprises: a first step of capturing an image of a fine pattern; a second step of extracting a contour of the fine pattern from the image; a third step of capturing a standard figure of the fine pattern; a fourth step of superimposing the standard figure on the contour by enlarging or reducing the standard figure while maintaining an aspect ratio thereof; a fifth step of extracting an intersection of the contour and the standard figure; a sixth step of extracting a differential region surrounded with the contour, the standard figure and the intersection; a seventh step of extracting a correction pattern region from the differential region; and an eighth step of measuring the correction pattern region.
摘要:
An image acquiring section acquires a pattern image of a sample. A figure creating section creates a figure, which reflects a shape of the micropattern, on the basis of the pattern image. A density distribution data acquiring section acquires density distribution data on a straight line perpendicular to a tangential line of an outline of the figure. An edge detecting section detects pattern edge coordinates from the density distribution data. A pattern shape measuring section measures a shape of the micropattern on the basis of the pattern edge coordinates.
摘要:
A pattern shape evaluation method includes acquiring an image of an evaluation target pattern including a plurality of element patterns; detecting edge of the evaluation target pattern from the image; classifying the detected edge of the evaluation target pattern into a plurality of evaluation target pattern edge groups; acquiring edge of a reference pattern serving as an evaluation standard for the element patterns; classifying the edge of the reference pattern into a plurality of reference pattern edge groups; selecting a reference pattern edge group to be aligned with the edge of the evaluation target pattern from the classified reference pattern edge groups; aligning the edge of the selected reference pattern edge group with the edge of the evaluation target pattern; and evaluating the shape of the evaluation target pattern by use of the result of the alignment.
摘要:
A pattern shape evaluation method includes acquiring an image of an evaluation target pattern including a plurality of element patterns; detecting edge of the evaluation target pattern from the image; classifying the detected edge of the evaluation target pattern into a plurality of evaluation target pattern edge groups; acquiring edge of a reference pattern serving as an evaluation standard for the element patterns; classifying the edge of the reference pattern into a plurality of reference pattern edge groups; selecting a reference pattern edge group to be aligned with the edge of the evaluation target pattern from the classified reference pattern edge groups; aligning the edge of the selected reference pattern edge group with the edge of the evaluation target pattern; and evaluating the shape of the evaluation target pattern by use of the result of the alignment.