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公开(公告)号：US11048163B2
公开(公告)日：2021-06-29
申请号：US15832752
申请日：2017-12-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tsun-Cheng Tang , Cheng-Ming Lin , Sheng-Chang Hsu , Hao-Ming Chang , Waylen Chang
Abstract: In accordance with some embodiments of the present disclosure, an inspection method of a photomask includes performing a first inspection process, unloading the photomask from the inspection system, and performing a second inspection process. In the first inspection process, a common Z calibration map of an objective lens of an optical module with respect to the photomask is generated and stored, and a first image of the photomask is captured by using an image sensor while focusing the objective lens of the optical module based on the common Z calibration map. The photomask is unloaded from the inspection system. In the second inspection process, the photomask is loaded on the inspection system and a second image of the photomask is captured by using an image sensor while focusing an objective lens of an optical module based on the common Z calibration map generated in the first inspection process.
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公开(公告)号：US20190137869A1
公开(公告)日：2019-05-09
申请号：US15832752
申请日：2017-12-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tsun-Cheng Tang , Cheng-Ming Lin , Sheng-Chang Hsu , Hao-Ming Chang , Waylen Chang
Abstract: In accordance with some embodiments of the present disclosure, an inspection method of a photomask includes performing a first inspection process, unloading the photomask from the inspection system, and performing a second inspection process. In the first inspection process, a common Z calibration map of an objective lens of an optical module with respect to the photomask is generated and stored, and a first image of the photomask is captured by using an image sensor while focusing the objective lens of the optical module based on the common Z calibration map. The photomask is unloaded from the inspection system. In the second inspection process, the photomask is loaded on the inspection system and a second image of the photomask is captured by using an image sensor while focusing an objective lens of an optical module based on the common Z calibration map generated in the first inspection process.
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