公开(公告)号：US09620326B2

公开(公告)日：2017-04-11

申请号：US14578575

申请日：2014-12-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chin-Tsung Lin ,  Hsiao-Yin Hsieh ,  Chi-Hao Huang ,  Hong-Shing Chou ,  Yeh-Chieh Wang

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/244

CPC classification number: H01J37/08 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/0203 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/30405

Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.