公开(公告)号：US10213943B2

公开(公告)日：2019-02-26

申请号：US15262730

申请日：2016-09-12

Applicant: TOYO GOSEI CO., LTD.

Inventor： Taigo Akasaki ,  Risa Wada ,  Takeshi Osaki

IPC: B29C41/24 ,  B29C41/44 ,  B29C35/08 ,  C08J5/18 ,  C08G18/62 ,  C08G18/81 ,  C08F290/06 ,  B29L7/00

Abstract: A suitable combination of a composition for formation of a resin mold with a pattern and a composition for formation of resin to which the pattern is transferred from the resin mold is found.

公开(公告)号：US20170072601A1

公开(公告)日：2017-03-16

申请号：US15262730

申请日：2016-09-12

Applicant: TOYO GOSEI CO., LTD.

Inventor： Taigo Akasaki ,  Risa Wada ,  Takeshi Osaki

IPC: B29C41/24 ,  C08G18/68 ,  C08J5/18 ,  B29C41/44 ,  B29C35/08

CPC classification number: B29C41/24 ,  B29C35/0805 ,  B29C41/44 ,  B29C2035/0827 ,  B29K2995/007 ,  B29L2007/008 ,  C08F290/04 ,  C08G18/6279 ,  C08G18/8116 ,  C08J5/18 ,  C08J2335/02 ,  C08J2375/16 ,  C08F2222/1013 ,  C08F222/1006 ,  C08F220/24 ,  C08F220/28 ,  C08F2220/286 ,  C08F2222/108 ,  C08F222/22 ,  C08F218/04

Abstract: A suitable combination of a composition for formation of a resin mold with a pattern and a composition for formation of resin to which the pattern is transferred from the resin mold is found.

Abstract translation: 发现用于形成具有图案的树脂模具的组合物和用于形成从树脂模具转印图案的树脂的组合物的合适组合。

公开(公告)号：US20160017074A1

公开(公告)日：2016-01-21

申请号：US14773268

申请日：2014-03-03

Applicant: TOYO GOSEI CO., LTD.

Inventor： Risa Wada ,  Takeshi Osaki

IPC: C08F222/10

CPC classification number: C08F222/10 ,  C08F290/06 ,  C08F299/024 ,  G03F7/0002 ,  G03F7/0046 ,  G03F7/027

Abstract: Described is a composition comprising: a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.

Abstract translation: 描述了一种组合物，其包含：具有取代基（a）的化合物（A）为丙烯酰基和甲基丙烯酰基中的至少一种，全氟亚烷基; 和具有取代基（b）的化合物（B）是丙烯酰基和甲基丙烯酰基中的一种，以及作为丙烯酰基和甲基丙烯酰基之一的取代基（c）。

公开(公告)号：US20160208127A1

公开(公告)日：2016-07-21

申请号：US15003620

申请日：2016-01-21

Applicant: TOYO GOSEI CO., LTD.

Inventor： Risa Wada ,  Takeshi Osaki

IPC: C09D133/08 ,  B29C35/08 ,  B29C59/02 ,  C09D133/14 ,  B29C59/00

Abstract: Compositions that are especially suitable for optical components are disclosed.

Abstract translation: 公开了特别适用于光学部件的组合物。

公开(公告)号：US09366782B2

公开(公告)日：2016-06-14

申请号：US14251461

申请日：2014-04-11

Applicant: Toyo Gosei Co., Ltd.

Inventor： Takeshi Osaki ,  Yuki Kawakami

IPC: C08F136/20 ,  C08F236/20 ,  G02B1/04 ,  B29D11/00 ,  C08L35/02

CPC classification number: G02B1/041 ,  G02B1/04 ,  C08L33/10 ,  C08L33/08

Abstract: Described is a resinous article of manufacture that is wrinkle-resistant and is warpage-resistant when subjected to very high temperatures. Such an article is useful as an optical lens.

Abstract translation: 描述了一种抗皱纹的树脂制品，并且在经受非常高的温度时具有抗翘曲性。 这样的物品作为光学透镜是有用的。

公开(公告)号：US10472446B2

公开(公告)日：2019-11-12

申请号：US14773268

申请日：2014-03-03

Applicant: TOYO GOSEI CO., LTD.

Inventor： Risa Wada ,  Takeshi Osaki

IPC: C08F222/10 ,  C08F290/06 ,  G03F7/00 ,  C08F299/02 ,  G03F7/004 ,  G03F7/027

Abstract: Described is a composition comprising: a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.

公开(公告)号：US10191370B2

公开(公告)日：2019-01-29

申请号：US15109620

申请日：2015-01-07

Applicant: TOYO GOSEI CO., LTD.

Inventor： Takeshi Osaki ,  Taigo Akasaki ,  Risa Wada

IPC: G03F7/027 ,  G03F7/028 ,  G03F7/004 ,  G03F7/075 ,  H01L21/033 ,  C08F230/02 ,  H01L21/027 ,  C08F230/00 ,  C08F2/48 ,  C08F2/50 ,  H01J37/32 ,  B82Y40/00 ,  B82Y30/00

Abstract: Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices.

公开(公告)号：US11635683B2

公开(公告)日：2023-04-25

申请号：US17317988

申请日：2021-05-12

Applicant: TOYO GOSEI CO., LTD.

Inventor： Takeshi Osaki

IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  G03F7/00 ,  C08K5/134 ,  C08F220/28 ,  C08F220/18 ,  C08K5/13 ,  C08K5/1575 ,  C08K5/3435 ,  C08F222/10

Abstract: A method for manufacturing a device including a substrate and a second film disposed above the substrate includes: forming a first film above the substrate using a composition containing a polymerizable monomer and an oxidation inhibitor; and forming the second film by curing the first film in a state where at least one part of a mold having a convexo-concave pattern is in contact with the first film, or after at least one part of the mold is brought into contact with the first film. The oxidation inhibitor is at least one of a hindered amine compound and a hindered phenol compound having a molecular weight of 700 or more. The composition satisfies a relationship of (t0(T)−tx(T))/t0(T)×100≤13.0. (t0(T) is a height of a convex part of cured film obtained by the specific method, and tx(T) is the corresponding height after heating at 260° C.)

公开(公告)号：US10189983B2

公开(公告)日：2019-01-29

申请号：US14655047

申请日：2013-12-25

Applicant: TOYO GOSEI CO., LTD.

Inventor： Risa Wada ,  Takeshi Osaki

IPC: C08L33/14 ,  G03F7/00 ,  B82Y10/00 ,  G03F7/004 ,  G03F7/027 ,  C08F299/06 ,  B82Y40/00 ,  C09D133/14

Abstract: A curable resin composition comprising: a fluorinated urethane(meth)acrylate represented by formula (1), wherein, R1, R2, R3 and R4 each independently represents a hydrogen atom or a methyl group, x and y each independently represents 1 or 2, and n represents an integer within the range of 1 to 10; R3 and R4 each independently represents the hydrogen atom when x and y are both 1; R3 represents the hydrogen atom and R4 represents the methyl group when x is 1 and y is 2; R3 represents the methyl group and R4 represents the hydrogen atom when x is 2 and y is 1; and R3 and R4 each independently represents the methyl group when x and y are both 2.

公开(公告)号：US20160326276A1

公开(公告)日：2016-11-10

申请号：US15109620

申请日：2015-01-07

Applicant: TOYO GOSEI CO., LTD

Inventor： Takeshi Osaki ,  Taigo Akasaki ,  Risa Wada

IPC: C08F2/50 ,  H01J37/32

CPC classification number: C08F2/50 ,  B82Y30/00 ,  B82Y40/00 ,  C08F2/48 ,  C08F230/00 ,  C08F230/02 ,  G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/0751 ,  H01J37/32009 ,  H01J2237/334 ,  H01L21/0271 ,  H01L21/0273 ,  H01L21/0337

Abstract: Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices.

Abstract translation: 组合物用于形成耐腐蚀树脂。 这样的树脂可用于制造组件或装置。