公开(公告)号：US20220017553A1

公开(公告)日：2022-01-20

申请号：US17292819

申请日：2019-11-08

Applicant: TOSOH CORPORATION ,  SAGAMI CHEMICAL RESEARCH INSTITUTE

Inventor： Hiroyuki OIKE ,  Teppei HAYAKAWA ,  Yuki YAMAMOTO ,  Taishi FURUKAWA ,  Ken-ichi TADA

IPC: C07F15/06 ,  C23C16/18

Abstract: To provide a cobalt complex which is liquid at room temperature, useful for producing a cobalt-containing thin film under conditions without using an oxidizing gas.
A cobalt complex represented by the following formula (1): L1-Co-L2  (1) wherein L1 and L2 represent a unidentate amide ligand of the following formula (A), a bidentate amide ligand of the following formula (B) or a hetero atom-containing ligand of the following formula (C): wherein R1 and R2 represent a C1-6 alkyl group or a tri(C1-6 alkyl)silyl group, and the wave line represents a binding site to the cobalt atom; wherein R3 represents a tri(C1-6 alkyl)silyl group, R4 and R5 represent a C1-4 alkyl group, and X represents a C1-6 alkylene group; wherein R6 and R8 represent a C1-6 alkyl group, R7 represents a hydrogen atom or a C1-4 alkyl group, Y represents an oxygen atom or NR9, Z represents an oxygen atom or NR10, and R9 and R10 independently represent a C1-6 alkyl group.

公开(公告)号：US20180362568A1

公开(公告)日：2018-12-20

申请号：US16061049

申请日：2016-12-12

Applicant: TOSOH CORPORATION ,  SAGAMI CHEMICAL RESEARCH INSTITUTE

Inventor： Naoyuki KOISO ,  Yuki YAMAMOTO ,  Hiroyuki OIKE ,  Teppei HAYAKAWA ,  Taishi FURUKAWA ,  Ken-ichi TADA

IPC: C07F17/02 ,  H01L29/49 ,  H01L29/45 ,  H01L23/532 ,  H01L21/02 ,  H01L21/285 ,  H01L21/28 ,  H01L21/768 ,  C23C16/18

CPC classification number: C07F17/02 ,  C07F15/06 ,  C07F17/00 ,  C07F19/00 ,  C23C16/18 ,  H01L21/02175 ,  H01L21/02271 ,  H01L21/28097 ,  H01L21/28518 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/76889 ,  H01L23/53238 ,  H01L29/456 ,  H01L29/4975

Abstract: Provided is a cobalt complex which is useful for the production of a cobalt-containing thin film under conditions where no oxidizing gas is used. A cobalt complex represented by general formula (1) (wherein R1 represents a silyloxy group represented by general formula (2) (wherein R6, R7 and R8 independently represent an alkyl group having 1 to 6 carbon atoms); R2 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a silyloxy group represented by general formula (2); R3, R4 and R5 independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and L represents a diene having 4 to 10 carbon atoms) is used.