公开(公告)号：US12191110B2

公开(公告)日：2025-01-07

申请号：US17725177

申请日：2022-04-20

Applicant: THE UNIVERSITY OF LIVERPOOL

Inventor： Nigel D Browning ,  Daniel Nicholls

IPC: H01J37/147 ,  G03F7/00 ,  H01J37/305 ,  H01J37/317

Abstract: A beam control method is provided that can be implemented with any hardware system for imaging and/or cutting such as SEM/FIB/HIM or charged particle lithography which alleviates the deposited energy overlap between pixels to increase resolution and precision while reducing damage. The method includes scanning a workpiece with e-beam lithography, proton lithography, ion beam lithography, optical lithography, ion beam imaging or FIB in a reduced or sub-sampled pattern, to reduce beam overlap, which can include the step of scanning the beam ensuring that there is the largest difference in time and space between consecutive beam locations.