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公开(公告)号：US09864270B2
公开(公告)日：2018-01-09
申请号：US14996966
申请日：2016-01-15
Inventor： Jeng-Shin Ma , Tsiao-Chen Wu , Chi-Ming Yang , Chyi Shyuan Chern , Chih-Cheng Lin , Yun-Yue Lin
Abstract: A method for manufacturing a pellicle includes: providing a supporting substrate; forming an oxide layer over the supporting substrate; forming a metal layer over the oxide layer; forming a graphene layer over the metal layer; and removing at least a portion of the supporting substrate and the oxide layer. An associated method includes: providing a supporting substrate; forming a first silicon carbide (SiC) layer or a diamond layer over the supporting substrate; forming a graphene layer over the SiC layer or the diamond layer; and removing at least a portion of the supporting substrate and the first silicon carbide (SiC) layer or the diamond layer; wherein the pellicle is at least partially transparent to extreme ultraviolet (EUV) radiation. An associated pellicle is also disclosed.
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公开(公告)号：US20170205705A1
公开(公告)日：2017-07-20
申请号：US14996966
申请日：2016-01-15
Inventor： Jeng-Shin Ma , Tsiao-Chen Wu , Chi-Ming Yang , Chyi Shyuan Chern , Chih-Cheng Lin , Yun-Yue Lin
IPC: G03F1/64
Abstract: A method for manufacturing a pellicle includes: providing a supporting substrate; forming an oxide layer over the supporting substrate; forming a metal layer over the oxide layer; forming a graphene layer over the metal layer; and removing at least a portion of the supporting substrate and the oxide layer. An associated method includes: providing a supporting substrate; forming a first silicon carbide (SiC) layer or a diamond layer over the supporting substrate; forming a graphene layer over the SiC layer or the diamond layer; and removing at least a portion of the supporting substrate and the first silicon carbide (SiC) layer or the diamond layer; wherein the pellicle is at least partially transparent to extreme ultraviolet (EUV) radiation. An associated pellicle is also disclosed.
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