METHODS FOR UNIFORM METAL IMPREGNATION INTO A NANOPOROUS MATERIAL
    1.
    发明申请
    METHODS FOR UNIFORM METAL IMPREGNATION INTO A NANOPOROUS MATERIAL 有权
    将金属均匀分解成纳米材料的方法

    公开(公告)号:US20130243656A1

    公开(公告)日:2013-09-19

    申请号:US13730431

    申请日:2012-12-28

    Abstract: The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210, Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of metal 150 deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon 110, immersion in a metal salt solution, 130, drying and thermal decomposition of the metal salt 140 to form a metal deposit 150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates 210 with one or more metal salt solutions 130. Other embodiments of the invention concern apparatus and/or systems 400 for Raman detection of analytes, comprising metal-coated porous silicon substrates 110, 210 prepared by the disclosed methods.

    Abstract translation: 本文公开的方法,系统400和装置涉及金属150浸渍的多孔基材110,210。本发明的某些实施方案涉及用于制造金属涂覆的多孔硅基板110,210的方法,其显示出显着改善金属150沉积物的均匀性和深度的渗透 。 增加的均匀性和深度允许分析物的改进和更可重复的拉曼检测。 在本发明的示例性实施方案中,所述方法可以包括多孔硅110的氧化,浸入金属盐溶液130,金属盐140的干燥和热分解以形成金属沉积物150.在本发明的其它示例性实施方案中, 该方法可以包括多孔硅衬底210与一种或多种金属盐溶液130的微流体浸渍。本发明的其它实施方案涉及用于分析物的拉曼检测的装置和/或系统400,包括金属涂覆的多孔硅衬底110,210,由 公开的方法。

    OPTICAL IDENTIFICATION TAG, READER AND SYSTEM
    5.
    发明申请
    OPTICAL IDENTIFICATION TAG, READER AND SYSTEM 审中-公开
    光学识别标签,读取器和系统

    公开(公告)号:US20100096447A1

    公开(公告)日:2010-04-22

    申请号:US12530367

    申请日:2008-03-07

    CPC classification number: G06K19/0723 G06K19/0728

    Abstract: The present invention relates to an optical identification tag, a reader, and a system, and more particularly, to an optical identification tag which transmits its identification information using energy input in an optical form, and an optical identification system and reader using the optical identification tag. The present invention provides an optical identification tag and an optical identification reader. The optical identification tag includes a solar cell for converting incident light into an electrical energy, a circuit for providing a transmitted electrical signal corresponding to identification information, and a light emitter for providing a transmitted optical signal corresponding to the transmitted electrical signal, and the optical identification reader provides the incident light to the optical identification tag, and receives the transmitted optical signal from the optical identification tag.

    Abstract translation: 光学识别标签,读取器和系统技术领域本发明涉及光学识别标签,读取器和系统,更具体地,涉及使用光学形式的能量输入来发送其识别信息的光学识别标签,以及使用光学识别的光学识别系统和读取器 标签。 本发明提供一种光学识别标签和光学识别读取器。 光学识别标签包括用于将入射光转换为电能的太阳能电池,用于提供与识别信息相对应的透射电信号的电路,以及用于提供对应于所发射的电信号的透射光信号的光发射器, 识别读取器将入射光提供给光学识别标签,并从光学识别标签接收所发送的光信号。

    NANOSTRUCTURE FABRICATION
    7.
    发明申请
    NANOSTRUCTURE FABRICATION 审中-公开
    纳米结构制造

    公开(公告)号:US20100055620A1

    公开(公告)日:2010-03-04

    申请号:US12323372

    申请日:2008-11-25

    Applicant: Sunghoon Kwon

    Inventor: Sunghoon Kwon

    CPC classification number: B82B3/00 B82Y10/00 B82Y30/00 B82Y40/00

    Abstract: Techniques for fabricating nanostructures are provided. In one embodiment a method includes forming a multilayer stack including at least one pair of a structural layer and a sacrificial layer on a substrate, patterning the multilayer stack in order to fabricate a nanostructure, and releasing the nanostructure from the patterned multilayer stack.

    Abstract translation: 提供了制造纳米结构的技术。 在一个实施例中,一种方法包括在衬底上形成包括至少一对结构层和牺牲层的多层堆叠,图案化多层堆叠以制造纳米结构,以及从图案化的多层堆叠释放纳米结构。

    NANOSTRUCTURES AND NANOSTRUCTURE FABRICATION
    8.
    发明申请
    NANOSTRUCTURES AND NANOSTRUCTURE FABRICATION 审中-公开
    纳米结构和纳米结构制造

    公开(公告)号:US20100048025A1

    公开(公告)日:2010-02-25

    申请号:US12197997

    申请日:2008-08-25

    Applicant: Sunghoon Kwon

    Inventor: Sunghoon Kwon

    Abstract: Nanostructure and techniques for fabricating nanostructures are provided. In one embodiment, nanostructures may be formed by providing a Silicon-on-Insulator (SOI) substrate, forming a pattern on the SOI substrate, disposing a conformal layer over the pattern, etching the conformal layer, except for a sidewall portion, removing the pattern, transferring the sidewall pattern to the silicon layer of the SOI substrate to form the nanostructure, and releasing the nanostructure.

    Abstract translation: 提供纳米结构和制造纳米结构的技术。 在一个实施例中,纳米结构可以通过提供绝缘体上硅(SOI)衬底形成,在SOI衬底上形成图案,在图案之上设置保形层,蚀刻除了侧壁部分之外的保形层,去除 将侧壁图案转移到SOI衬底的硅层以形成纳米结构,并释放纳米结构。

    Methods for uniform metal impregnation into a nanoporous material
    9.
    发明授权
    Methods for uniform metal impregnation into a nanoporous material 有权
    均匀金属浸渍到纳米多孔材料中的方法

    公开(公告)号:US07608305B2

    公开(公告)日:2009-10-27

    申请号:US11436489

    申请日:2006-05-18

    Abstract: The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of metal 150 deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon 110, immersion in a metal salt solution 130, drying and thermal decomposition of the metal salt 140 to form a metal deposit 150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates 210 with one or more metal salt solutions 130. Other embodiments of the invention concern apparatus and/or systems 400 for Raman detection of analytes, comprising metal-coated porous silicon substrates 110, 210 prepared by the disclosed methods.

    Abstract translation: 本文公开的方法,系统400和装置涉及金属150浸渍的多孔基材110,210。本发明的某些实施方案涉及用于制造金属涂覆的多孔硅基板110,210的方法,其显示极大地改善了金属150沉积物的均匀性和深度的穿透 。 增加的均匀性和深度允许分析物的改进和更可重复的拉曼检测。 在本发明的示例性实施例中,所述方法可以包括多孔硅110的氧化,浸入金属盐溶液130中,干燥和热分解金属盐140以形成金属沉积物150.在本发明的其它示例性实施方案中, 方法可以包括多孔硅衬底210与一种或多种金属盐溶液130的微流体浸渍。本发明的其它实施方案涉及用于分析物的拉曼检测的装置和/或系统400,包括金属涂覆的多孔硅衬底110,210,由 公开的方法。

    Methods for uniform metal impregnation into a nanoporous material
    10.
    发明申请
    Methods for uniform metal impregnation into a nanoporous material 有权
    均匀金属浸渍到纳米多孔材料中的方法

    公开(公告)号:US20070116605A1

    公开(公告)日:2007-05-24

    申请号:US11436507

    申请日:2006-05-17

    Abstract: The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of metal 150 deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon 110, immersion in a metal salt solution 130, drying and thermal decomposition of the metal salt 140 to form a metal deposit 150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates 210 with one or more metal salt solutions 130. Other embodiments of the invention concern apparatus and/or systems 400 for Raman detection of analytes, comprising metal-coated porous silicon substrates 110, 210 prepared by the disclosed methods.

    Abstract translation: 本文公开的方法,系统400和装置涉及金属150浸渍的多孔基底110,210。 本发明的某些实施方案涉及用于制造金属涂覆的多孔硅衬底110,210的方法,其显示极大地改善金属150沉积的均匀性和穿透深度。 增加的均匀性和深度允许分析物的改进和更可重复的拉曼检测。 在本发明的示例性实施例中,所述方法可以包括多孔硅110的氧化,浸入金属盐溶液130中,干燥和热分解金属盐140以形成金属沉积物150。 在本发明的其它示例性实施方案中,所述方法可包括多孔硅衬底210与一种或多种金属盐溶液130的微流体浸渍。 本发明的其它实施方案涉及用于分析物的拉曼检测的装置和/或系统400,包括通过公开的方法制备的金属涂覆的多孔硅基板110,210。

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