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1.发明授权公开(公告)号：US08932110B2
公开(公告)日：2015-01-13
申请号：US13045918
申请日：2011-03-11
申请人： Shoji Sakaguchi , Masaoki Miyakoshi , Jun Natsume
发明人： Shoji Sakaguchi , Masaoki Miyakoshi , Jun Natsume
CPC分类号： B24B37/044 , B24B37/013 , B24B37/245 , C09G1/02 , C09K3/1463 , G11B5/8404
摘要： A method of manufacturing a perpendicular magnetic recording medium substrate is capable of reducing the waviness of all wavelength components and a recording medium is capable of reducing contact with a magnetic head to improve the flying stability of the magnetic head. The method includes two polishing operations. The first operation includes polishing a substrate having a Ni—P-based alloy underlayer with a first porous material that includes 0.1 wt % to 25 wt % of alumina, titania, silica, and zirconia abrasive while supplying a first slurry liquid including an organic or inorganic acid and a first abrasive to the underlayer of the substrate. The second operation includes polishing a surface of the underlayer polished in the first polishing with a second porous material while supplying a second slurry liquid including an organic or inorganic acid and a second abrasive with a grain diameter smaller than that of the first abrasive.
摘要翻译： 垂直磁记录介质基板的制造方法能够减少所有波长成分的波纹，记录介质能够减小与磁头的接触，提高磁头的飞行稳定性。 该方法包括两次抛光操作。 第一操作包括：在第一浆料液体的同时，提供含有Ni-P基合金底层的基材，该第一多孔材料包括0.1重量％至25重量％的氧化铝，二氧化钛，二氧化硅和氧化锆磨料， 无机酸和基材的底层的第一研磨剂。 第二操作包括用第二多孔材料抛光在第一抛光中抛光的底层的表面，同时提供包括有机或无机酸的第二浆料液体和具有小于第一研磨剂粒径的第二研磨剂。
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2.发明申请公开(公告)号：US20120009441A1
公开(公告)日：2012-01-12
申请号：US13045918
申请日：2011-03-11
申请人： Shoji SAKAGUCHI , Masaoki Miyakoshi , Jun Natsume
发明人： Shoji SAKAGUCHI , Masaoki Miyakoshi , Jun Natsume
CPC分类号： B24B37/044 , B24B37/013 , B24B37/245 , C09G1/02 , C09K3/1463 , G11B5/8404
摘要： A method of manufacturing a perpendicular magnetic recording medium substrate is capable of reducing the waviness of all wavelength components and a recording medium is capable of reducing contact with a magnetic head to improve the flying stability of the magnetic head. The method includes two polishing operations. The first operation includes polishing a substrate having a Ni—P-based alloy underlayer with a first porous material that includes 0.1 wt % to 25 wt % of alumina, titania, silica, and zirconia abrasive while supplying a first slurry liquid including an organic or inorganic acid and a first abrasive to the underlayer of the substrate. The second operation includes polishing a surface of the underlayer polished in the first polishing with a second porous material while supplying a second slurry liquid including an organic or inorganic acid and a second abrasive with a grain diameter smaller than that of the first abrasive.
摘要翻译： 垂直磁记录介质基板的制造方法能够减少所有波长成分的波纹，记录介质能够减小与磁头的接触，提高磁头的飞行稳定性。 该方法包括两次抛光操作。 第一操作包括：在第一浆料液体的同时，提供含有Ni-P基合金底层的基材，该第一多孔材料包括0.1重量％至25重量％的氧化铝，二氧化钛，二氧化硅和氧化锆磨料， 无机酸和基材的底层的第一研磨剂。 第二操作包括用第二多孔材料抛光在第一抛光中抛光的底层的表面，同时提供包括有机或无机酸的第二浆料液体和具有小于第一研磨剂粒径的第二研磨剂。
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