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1.发明授权Medical image diagnosis apparatus specifying a spot on a projection image for subsequent 3D imaging 失效医疗图像诊断装置，用于指定用于后续3D成像的投影图像上的斑点公开(公告)号：US08520915B2
公开(公告)日：2013-08-27
申请号：US11854107
申请日：2007-09-12
IPC分类号： G06K9/00
摘要： A medical image diagnosis apparatus designates an imaging range of a subject from a projection image for designation of the imaging range, specifies a specific spot on the projection image, performs scanning for generating a three-dimensional medical image of the subject on the basis of the imaging range, finds out a three-dimensional target region from the three-dimensional medical image on the basis of the specific spot, and detects a candidate for an abnormal part in the three-dimensional target region.
摘要翻译： 医用图像诊断装置从投影图像中指定成像范围的指定对象的摄像范围，指定投影图像上的特定斑点，根据该图像进行用于生成被检者的三维医学图像的扫描 基于该特定光斑从三维医学图像中求出三维目标区域，并且检测三维目标区域中的异常部分的候选。
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2.发明申请MEDICAL IMAGE DIAGNOSIS APPARATUS, AND X-RAY CT APPARATUS, AND IMAGE PROCESSOR 失效医学图像诊断设备和X射线CT设备和图像处理器公开(公告)号：US20080063136A1
公开(公告)日：2008-03-13
申请号：US11854107
申请日：2007-09-12
摘要： A medical image diagnosis apparatus designates an imaging range of a subject from a projection image for designation of the imaging range, specifies a specific spot on the projection image, performs scanning for generating a three-dimensional medical image of the subject on the basis of the imaging range, finds out a three-dimensional target region from the three-dimensional medical image on the basis of the specific spot, and detects a candidate for an abnormal part in the three-dimensional target region.
摘要翻译： 医用图像诊断装置从投影图像中指定成像范围的指定对象的摄像范围，指定投影图像上的特定斑点，根据该图像进行用于生成被检者的三维医学图像的扫描 基于该特定光斑从三维医学图像中求出三维目标区域，并且检测三维目标区域中的异常部分的候选。
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公开(公告)号：US07470897B2
公开(公告)日：2008-12-30
申请号：US11671233
申请日：2007-02-05
申请人： Takuzo Takayama , Katsuhiko Fujimoto , Shigeharu Ohyu , Yasuo Sakurai , Mariko Shibata , Atsuko Sugiyama , Keisuke Hashimoto
发明人： Takuzo Takayama , Katsuhiko Fujimoto , Shigeharu Ohyu , Yasuo Sakurai , Mariko Shibata , Atsuko Sugiyama , Keisuke Hashimoto
IPC分类号： G12B13/00
CPC分类号： G01T1/2985 , A61B6/4258 , G01T1/1663
摘要： A nuclear medical apparatus for obtaining a distribution of a radioisotope in a subject by administering to a subject a radioactive medicine labeled with a radioisotope, detecting gamma rays given off from the radioisotope in a gamma-ray detecting section and counting the detected gamma rays in a count section. A correcting section is provided to correct for a count taken at the count section, by use of collection efficiency data determined according to the gamma-ray detecting section and an energy the gamma rays possesses.
摘要翻译： 一种用于通过向受试者施用用放射性同位素标记的放射性药物来检测受试者中放射性同位素分布的核医疗装置，其检测伽马射线检测部分中从放射性同位素发出的γ射线，并对所检测的γ射线进行计数 计数部分。 提供校正部分，以通过使用根据伽马射线检测部分确定的收集效率数据和伽马射线拥有的能量来校正在计数部分获得的计数。
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公开(公告)号：US20070194222A1
公开(公告)日：2007-08-23
申请号：US11671233
申请日：2007-02-05
申请人： Takuzo Takayama , Katsuhiko Fujimoto , Shigeharu Ohyu , Yasuo Sakurai , Mariko Shibata , Atsuko Sugiyama , Keisuke Hashimoto
发明人： Takuzo Takayama , Katsuhiko Fujimoto , Shigeharu Ohyu , Yasuo Sakurai , Mariko Shibata , Atsuko Sugiyama , Keisuke Hashimoto
IPC分类号： G01T1/161
CPC分类号： G01T1/2985 , A61B6/4258 , G01T1/1663
摘要： A nuclear medical apparatus for obtaining a distribution of a radioisotope in a subject by administering to a subject a radioactive medicine labeled with a radioisotope, detecting gamma rays given off from the radioisotope in a gamma-ray detecting section and counting the detected gamma rays in a count section. A correcting section is provided to correct for a count taken at the count section, by use of collection efficiency data determined according to the gamma-ray detecting section and an energy the gamma rays possesses.
摘要翻译： 一种用于通过向受试者施用用放射性同位素标记的放射性药物来检测受试者中放射性同位素分布的核医疗装置，其检测伽马射线检测部分中从放射性同位素发出的γ射线，并对所检测的γ射线进行计数 计数部分。 提供校正部分，以通过使用根据伽马射线检测部分确定的收集效率数据和伽马射线拥有的能量来校正在计数部分获得的计数。
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公开(公告)号：US20070161944A1
公开(公告)日：2007-07-12
申请号：US11617420
申请日：2006-12-28
IPC分类号： A61N1/30
CPC分类号： A61M37/0092 , A61M2037/0007
摘要： A method of introducing an ultrasonic drug includes irradiating a low frequency sound wave onto a subject, irradiating a high frequency ultrasonic wave onto a target region of the subject, and introducing the drug into the target region.
摘要翻译： 引入超声波药物的方法包括将低频声波照射到被检体上，将高频超声波照射到被检体的目标区域，将药物引入目标区域。
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公开(公告)号：US07854719B2
公开(公告)日：2010-12-21
申请号：US11617420
申请日：2006-12-28
IPC分类号： A61B17/20
CPC分类号： A61M37/0092 , A61M2037/0007
摘要： A method of introducing an ultrasonic drug includes irradiating a low frequency sound wave onto a subject, irradiating a high frequency ultrasonic wave onto a target region of the subject, and introducing the drug into the target region.
摘要翻译： 引入超声波药物的方法包括将低频声波照射到被检体上，将高频超声波照射到被检体的目标区域，将药物引入目标区域。
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7.发明授权Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin 有权含有含脂环骨架的咔唑树脂的抗蚀下层成膜组合物公开(公告)号：US09343324B2
公开(公告)日：2016-05-17
申请号：US14131011
申请日：2012-07-05
IPC分类号： G03F7/004 , H01L21/308 , G03F7/40 , G03F7/32 , G03F7/38 , C08F26/12 , C08F226/06 , H01L21/306 , G03F7/11 , C08G61/12 , G03F7/09 , H01L21/027
CPC分类号： H01L21/3081 , C08F26/12 , C08F226/06 , C08G61/124 , C08G2261/3241 , C08G2261/3325 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/32 , G03F7/38 , G03F7/40 , H01L21/0271 , H01L21/30604
摘要： There is provided a resist underlayer film used in lithography process that has a high n value and a low k value, and can effectively reduce reflection of light having a wavelength of 193 nm from the substrate in a three-layer process in which the resist underlayer film is used in combination with a silicon-containing intermediate layer. A resist underlayer film-forming composition used in lithography process including: a polymer containing a unit structure including a product obtained by reaction of a condensed heterocyclic compound and a bicyclo ring compound. The condensed heterocyclic compound is a carbazole compound or a substituted carbazole compound. The bicyclo ring compound is dicyclopentadiene, substituted dicyclopentadiene, tetracyclo[4.4.0.12,5.17,10]dodeca-3,8-diene, or substituted tetracyclo[4.4.0.12,5.17,10]dodeca-3,8-diene.
摘要翻译： 提供了在光刻工艺中使用的抗蚀剂下层膜，其具有高n值和低k值，并且可以有效地减少在其中抗蚀剂底层的三层工艺中具有193nm波长的光的反射 膜与含硅中间层组合使用。 在光刻工艺中使用的抗蚀剂下层膜形成组合物，包括：包含通过稠合杂环化合物与双环化合物反应得到的产物的单元结构的聚合物。 稠合杂环化合物是咔唑化合物或取代的咔唑化合物。 双环环化合物是二环戊二烯，取代的二环戊二烯，四环[4.4.0.12,5.17,10]十二碳-3,8-二烯或取代的四环[4.4.0.12,5.17,10]十二碳-3,8-二烯。
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8.发明授权公开(公告)号：US08778233B2
公开(公告)日：2014-07-15
申请号：US13459700
申请日：2012-04-30
申请人： Shigehiro Ueno , Keisuke Hashimoto , Masato Okada , Seiji Take , Yosuke Taguchi , Masataka Kano , Shin-ya Fujimoto
发明人： Shigehiro Ueno , Keisuke Hashimoto , Masato Okada , Seiji Take , Yosuke Taguchi , Masataka Kano , Shin-ya Fujimoto
IPC分类号： H01B1/12
CPC分类号： H01L51/5056 , C09D11/52 , H01L51/0035 , H01L51/0039 , H01L51/0059 , H01L51/5088 , H01L51/5234 , H01L2251/5369 , H05B33/10 , Y02E10/549 , Y02P70/521
摘要： The present invention is to provide a device capable of having an easy production process and achieving a long lifetime. A device comprising a substrate, two or more electrodes facing each other disposed on the substrate and a positive hole injection transport layer disposed between two electrodes among the two or more electrodes, wherein the positive hole injection transport layer comprises a transition metal-containing nanoparticle containing at least a transition metal compound including a transition metal oxide, a transition metal and a protecting agent, or at least the transition metal compound including the transition metal oxide, and the protecting agent.
摘要翻译： 本发明是提供一种能够容易地制造和实现长寿命的装置。 一种装置，其特征在于，包括基板，两个或多个彼此面对的电极，设置在所述基板上，以及空穴注入传输层，设置在所述两个或更多个电极之间的两个电极之间，其中所述空穴注入传输层包含含过渡金属的纳米颗粒， 至少包含过渡金属氧化物，过渡金属和保护剂的过渡金属化合物，或至少包含过渡金属氧化物的过渡金属化合物和保护剂。
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9.发明申请Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound 有权含有聚硅烷化合物的平版印刷用底层涂料组合物公开(公告)号：US20080318158A1
公开(公告)日：2008-12-25
申请号：US11920840
申请日：2006-05-12
CPC分类号： G03F7/0752 , C09D183/16 , G03F7/11 , Y10S430/128
摘要： There is provided an underlayer coating for lithography that is used in lithography process of the manufacture of semiconductor devices, that can be used as a hardmask, and that causes no intermixing with photoresists; and a composition for forming the underlayer coating.The composition comprises a polysilane compound, a crosslinkable compound, a crosslinking catalyst and a solvent. The polysilane compound is preferably a polysilane compound having a bond between silicons at the main chain.
摘要翻译： 提供了用于光刻的底层涂层，其用于制造半导体器件的光刻工艺，其可以用作硬掩模，并且不会与光致抗蚀剂混合; 和用于形成下层涂层的组合物。 该组合物包含聚硅烷化合物，可交联化合物，交联催化剂和溶剂。 聚硅烷化合物优选为在主链上具有硅的键的聚硅烷化合物。
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10.发明申请Underlayer Coating Forming Composition For Lithography Containing Cyclodextrin Compound 有权含有环糊精化合物的平版印刷的底层涂层成型组合物公开(公告)号：US20070292767A1
公开(公告)日：2007-12-20
申请号：US11666342
申请日：2005-10-25
申请人： Satoshi Takei , Tetsuya Shinjo , Keisuke Hashimoto
发明人： Satoshi Takei , Tetsuya Shinjo , Keisuke Hashimoto
IPC分类号： G03F7/11 , H01L21/027
CPC分类号： G03F7/091 , G03F7/094 , G03F7/11 , H01L21/0276 , H01L21/31144 , H01L21/312 , H01L21/76808 , Y10S430/111 , Y10S430/115
摘要： There is provided an underlayer coating forming composition for lithography for forming an underlayer coating having a high dry etching rate compared with photoresist, causing no intermixing with the photoresist, and excellent in property of filling hole on the semiconductor substrate, which is used in lithography process of manufacture of semiconductor device. The composition comprises a cyclodextrin compound that 10% to 90% of total number of hydroxy groups in cyclodextrin is converted into an ether or ester group, a crosslinking compound, a crosslinking catalyst and a solvent.
摘要翻译： 提供了一种用于光刻的底层涂层形成组合物，用于形成与光致抗蚀剂相比具有高干蚀刻速率的下层涂层，不会与光致抗蚀剂混合，并且在光刻工艺中使用的半导体衬底上的填充孔性质优异 的半导体器件的制造。 该组合物包含环糊精中羟基总数的10〜90％转化为醚或酯基的环糊精化合物，交联化合物，交联催化剂和溶剂。
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