公开(公告)号：US09905259B2

公开(公告)日：2018-02-27

申请号：US14699412

申请日：2015-04-29

Applicant: Seagate Technology LLC

Inventor： Sundeep Chauhan ,  Alexander Kantorov ,  Kim Yang Lee ,  David Kuo ,  Rene Johannes Marinus Van de Veerdonk ,  Barmeshwar Vikaramaditya

IPC: G11B5/17 ,  G11B5/86 ,  G11B5/74 ,  G11B5/855 ,  G03F7/004 ,  G11B5/596 ,  G11B11/03

CPC classification number: G11B5/865 ,  G03F7/0041 ,  G11B5/59638 ,  G11B5/746 ,  G11B5/855 ,  G11B11/03

Abstract: Provided herein is a method, including forming a first template including a first pattern, wherein forming the first template includes self-assembly of diblock copolymers guided by an initial pattern; forming a second template including a second pattern, wherein the second pattern corresponds to a servo pattern; and forming a master template from the first template, wherein the master template includes one or more portions of the first pattern combined with the second pattern.

公开(公告)号：US20150302881A1

公开(公告)日：2015-10-22

申请号：US14699412

申请日：2015-04-29

Applicant: Seagate Technology LLC

Inventor： Sundeep Chauhan ,  Alexander Kantorov ,  Kim Yang Lee ,  David Kuo ,  Rene Johannes Marinus Van de Veerdonk ,  Barmeshwar Vikaramaditya

IPC: G11B5/86 ,  G11B5/855 ,  G11B5/596 ,  G03F7/004 ,  G11B11/03

CPC classification number: G11B5/865 ,  G03F7/0041 ,  G11B5/59638 ,  G11B5/746 ,  G11B5/855 ,  G11B11/03

Abstract: Provided herein is a method, including forming a first template including a first pattern, wherein forming the first template includes self-assembly of diblock copolymers guided by an initial pattern; forming a second template including a second pattern, wherein the second pattern corresponds to a servo pattern; and forming a master template from the first template, wherein the master template includes one or more portions of the first pattern combined with the second pattern.

Abstract translation: 本文提供的方法包括形成包括第一图案的第一模板，其中形成第一模板包括由初始图案引导的二嵌段共聚物的自组装; 形成包括第二图案的第二模板，其中所述第二图案对应于伺服图案; 以及从所述第一模板形成主模板，其中所述主模板包括与所述第二模式组合的所述第一模式的一个或多个部分。