公开(公告)号：US20240412960A1

公开(公告)日：2024-12-12

申请号：US18404645

申请日：2024-01-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jawon KO ,  Jongwha LEE ,  Taijo JEON ,  Yunsong JEONG ,  Jaesup LEE ,  Solhee IN

IPC: H01J37/32

Abstract: A sensor device includes a first substrate, a second substrate on the first substrate, a plurality of detection units between the first substrate and the second substrate and configured to collect detection information from plasma formed in a space above the second substrate, a controller configured to generate characteristic data representing characteristics of the plasma based on the detection information collected by the plurality of detection units, and a power supply unit including a radio frequency (RF) energy harvester configured to produce power for operation of at least one of the plurality of detection units and the controller from RF power used to form the plasma.

公开(公告)号：US20250069869A1

公开(公告)日：2025-02-27

申请号：US18636962

申请日：2024-04-16

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jonghwa LEE ,  Jawon KO ,  Taijo JEON ,  Yunsong JEONG

IPC: H01J37/32

Abstract: A plasma processing apparatus includes a chamber in which plasma is generated, a support portion configured to support an object to be processed within the chamber, a head portion within the chamber and opposite to the support portion in a first direction, and a plasma analyzer including: a plurality of light collectors in the head portion, the plurality of light collectors configured to receive light emitted from plasma at a plurality of positions, a spectrometer outside the chamber nd connected to the plurality of light collectors, and a multiplexer connected between the plurality of light collectors and the spectrometer, the multiplexer configured to select one of a plurality of lights transmitted from the plurality of light collectors and transmit the selected one of the plurality of lights to the spectrometer.

公开(公告)号：US20250069871A1

公开(公告)日：2025-02-27

申请号：US18597432

申请日：2024-03-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jonghwa LEE ,  Jawon KO ,  Taijo JEON ,  Yunsong JEONG

IPC: H01J37/32 ,  G01J3/28 ,  H01L21/66

Abstract: A sensor apparatus for analyzing plasma in a plasma processing chamber, includes: a first substrate; a second substrate on the first substrate; and a plurality of sensors between the first substrate and the second substrate, the plurality of sensors being spaced apart from each other, wherein each of the plurality of sensors includes: (a) a sensing assembly that includes: (i) a wavelength selector on which light emitted from the plasma is incident and that is configured to separate wavelengths of a spectrum of the light, and (ii) a spectrometer that is optically connected to the wavelength selector and that is configured to detect the spectrum for each separated wavelength; and (b) a battery connected to the sensing assembly and configured to supply first power to the sensing assembly.

公开(公告)号：US20240203714A1

公开(公告)日：2024-06-20

申请号：US18224664

申请日：2023-07-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yunsong JEONG

IPC: H01J37/32

CPC classification number: H01J37/32972 ,  H01J2237/24585 ,  H01J2237/334

Abstract: A plasma monitoring system includes a chamber with an interior space, the chamber being configured to perform a semiconductor process on a semiconductor substrate using plasma in the interior space, and the chamber including an optical window, a substrate stage within the chamber to support the semiconductor substrate, a light collecting device on the substrate stage, the light collecting device including a body and light collectors, the body having through holes therethrough, and the light collectors being configured to collect light respectively incident on the through holes from the plasma and to transfer the collected lights onto the optical window, and a light analyzer including a spectrometer that is configured to obtain an optical spectrum from each light irradiated onto the optical window, and to map a state of the plasma from the optical spectrum to correspond to positions of the through holes.

公开(公告)号：US20230175974A1

公开(公告)日：2023-06-08

申请号：US17940308

申请日：2022-09-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Junghoon CHOI ,  Yunsong JEONG ,  Sangyong YU

IPC: G01N21/88 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/956 ,  G01N2021/95676

Abstract: An inspection system includes a stage unit configured to load a blank mask thereon. A side illumination unit, which is disposed to face a side surface of the blank mask and includes a plurality of LEDs, is provided. A camera disposed adjacent to the blank mask is provided. An inspection light beam irradiated from the side illumination unit toward the side surface of the blank mask is substantially parallel to an upper surface of the blank mask.