公开(公告)号：US20150261024A1

公开(公告)日：2015-09-17

申请号：US14596907

申请日：2015-01-14

Applicant: Samsung Electronics Co., Ltd. ,  Samsung Display Co, Ltd.

Inventor： Chi-youn Chung ,  Young-jin Noh ,  Eun-ah Park ,  Ji-min Lee ,  Sung-mo Gu

IPC: G02F1/1334 ,  G01R31/26 ,  G02F1/1335 ,  G02F1/1339 ,  G02F1/13 ,  G02F1/1343

CPC classification number: G02F1/133553 ,  G02F1/1309 ,  G02F1/137 ,  G02F2001/13775 ,  G09G3/006

Abstract: An electro-optic modulator includes an electro-optic sensor layer including a liquid crystal stabilized by a polymer network having a three-dimensional mesh structure that extends from a first surface of the electro-optic sensor layer to second surface of the electro-optic sensor layer opposite the first surface, a transparent electrode layer on the first surface of the electro-optic sensor layer, and a reflective layer on the second surface of the electro-optic sensor layer. A thin film transistor (TFT) array test apparatus includes a light source, an electro-optic modulator including an electro-optic sensor layer formed of a polymer network liquid crystal (PNLC), a power supply that applies a voltage between a transparent electrode layer of the electro-optic modulator and a plurality of pixel electrodes, and a reflected light sensor that measures light reflected from the electro-optic modulator.

Abstract translation: 电光调制器包括电光传感器层，其包括由聚合物网络稳定的液晶，所述聚合物网络具有从电光传感器层的第一表面延伸到电光传感器的第二表面的三维网格结构 所述电光传感器层的第一表面上的透明电极层和所述电光传感器层的第二表面上的反射层。 薄膜晶体管（TFT）阵列测试装置包括光源，包括由聚合物网络液晶（PNLC）形成的电光传感器层的电光调制器，在透明电极层 的电光调制器和多个像素电极以及测量从电光调制器反射的光的反射光传感器。

公开(公告)号：US10224185B2

公开(公告)日：2019-03-05

申请号：US14689559

申请日：2015-04-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-jin Noh ,  Kwang-min Park ,  Eun-sung Seo ,  Young-chang Song ,  Jae-young Ahn ,  Hun-hyeong Lim ,  Ji-hoon Choi

IPC: C23C16/455 ,  H01J37/32

Abstract: A substrate processing apparatus including a process chamber configured to receive a plurality of substrates oriented in a horizontal manner and vertically arranged with respect to the process chamber, a process gas supply unit configured to supply at least one process gas to the process chamber through a process gas supply nozzle, the process gas supply nozzle along an inner wall of the process chamber in a direction in which the substrates are sacked, an exhaust unit configured to exhaust the process gas from the process chamber, and a blocking gas supply unit configured to supply a blocking gas through a blocking gas injector provided in a circumferential direction of the process chamber such that a flow of the process gas in the process chamber is controlled may be provided.