公开(公告)号：US10224185B2

公开(公告)日：2019-03-05

申请号：US14689559

申请日：2015-04-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-jin Noh ,  Kwang-min Park ,  Eun-sung Seo ,  Young-chang Song ,  Jae-young Ahn ,  Hun-hyeong Lim ,  Ji-hoon Choi

IPC: C23C16/455 ,  H01J37/32

Abstract: A substrate processing apparatus including a process chamber configured to receive a plurality of substrates oriented in a horizontal manner and vertically arranged with respect to the process chamber, a process gas supply unit configured to supply at least one process gas to the process chamber through a process gas supply nozzle, the process gas supply nozzle along an inner wall of the process chamber in a direction in which the substrates are sacked, an exhaust unit configured to exhaust the process gas from the process chamber, and a blocking gas supply unit configured to supply a blocking gas through a blocking gas injector provided in a circumferential direction of the process chamber such that a flow of the process gas in the process chamber is controlled may be provided.

公开(公告)号：US11181508B2

公开(公告)日：2021-11-23

申请号：US16416704

申请日：2019-05-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Si-hoon Lee ,  Min-chul Lee ,  Kwang-min Park ,  Jeong-ho Park

IPC: G01N29/32 ,  G01N29/02

Abstract: A gas sensing system includes a driving circuit chip, and a gas sensor, a temperature sensor, and a humidity sensor, which are located on the driving circuit chip. The gas sensing system compensates a gas sensing result based on at least one of a temperature sensing result and a humidity sensing result and generates a gas sensing signal. The gas sensor includes a first resonator and a first sensing film being configured to sense a first gas and located on the first resonator to be exposed to the outside. The temperature sensor includes a second resonator and an encapsulation layer located above the second resonator not to expose the second resonator to the outside, and the humidity sensor includes a third resonator.

公开(公告)号：US11119075B2

公开(公告)日：2021-09-14

申请号：US16414029

申请日：2019-05-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeong-ho Park ,  Eun-je Hyun ,  Kwang-min Park ,  Min-chul Lee

IPC: G01N29/30 ,  G01N29/036 ,  G01N29/02 ,  G01N33/00

Abstract: A gas sensor including a gas sensing device having a resonant frequency that varies with adsorbed chemicals, a frequency detector configured to detect the resonant frequency of the gas sensing device, a calibrator configured to generate current calibration data based on the resonant frequency of the gas sensing device which has been heated to a calibration temperature in a calibration mode, and a compensator configured to adjust an output value of the frequency detector based on the current calibration data in a sensing mode may be provided.