公开(公告)号：US20180358242A1

公开(公告)日：2018-12-13

申请号：US15827144

申请日：2017-11-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-hoo Kim ,  Sang-jine PARK ,  Yong-jhin CHO ,  Yeon-jin GIL ,  Ji-hoon JEONG ,  Byung-kwon CHO ,  Yong-sun KO ,  Kun-tack LEE

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67034 ,  H01L21/02101 ,  H01L21/67126 ,  H01L21/68735

Abstract: A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate supported by the substrate support.

公开(公告)号：US11887868B2

公开(公告)日：2024-01-30

申请号：US17215928

申请日：2021-03-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-hoo Kim ,  Sang-jine Park ,  Yong-jhin Cho ,  Yeon-jin Gil ,  Ji-hoon Jeong ,  Byung-kwon Cho ,  Yong-sun Ko ,  Kun-tack Lee

IPC: H01L21/67 ,  H01L21/02 ,  B08B7/00 ,  H01L21/687

CPC classification number: H01L21/67034 ,  B08B7/0021 ,  H01L21/6719 ,  H01L21/67126 ,  H01L21/68735 ,  H01L21/02101

Abstract: A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate supported by the substrate support.

公开(公告)号：US20210217635A1

公开(公告)日：2021-07-15

申请号：US17215928

申请日：2021-03-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-hoo Kim ,  Sang-jine PARK ,  Yong-jhin CHO ,  Yeon-jin GIL ,  Ji-hoon JEONG ,  Byung-kwon CHO ,  Yong-sun KO ,  Kun-tack LEE

IPC: H01L21/67 ,  H01L21/687

Abstract: A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate supported by the substrate support.

公开(公告)号：US10332762B2

公开(公告)日：2019-06-25

申请号：US15172740

申请日：2016-06-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-hoo Kim ,  Il-sang Lee ,  In-gi Kim ,  Kyoung-hwan Kim ,  Hyo-san Lee ,  Sang-won Bae ,  Tae-hong Kim ,  Yong-jun Choi

IPC: H01L21/67

Abstract: A chemical liquid supply apparatus includes a nozzle unit including a nozzle arm and an injection nozzle mounted in an end of the nozzle arm, a chemical liquid supply unit including a first chemical liquid tank accommodating a first chemical liquid and a second chemical liquid tank accommodating a second chemical liquid, and supplying the first chemical liquid and the second chemical liquid to the nozzle unit, and a mixer unit provided in the nozzle unit and discharging a process fluid by mixing the first chemical liquid and the second chemical liquid, wherein the mixer unit includes an in-line mixer mixing the first chemical liquid and the second chemical liquid that are continually injected from the chemical liquid supply unit, and a mixer pipe extending from the in-line mixer to the injection nozzle.