公开(公告)号：US10352964B2

公开(公告)日：2019-07-16

申请号：US15415034

申请日：2017-01-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyeong-mi Lee ,  Jeong-ju Park ,  Shi-yong Yi ,  Eun-sung Kim ,  Seung-chul Kwon ,  Sang-ouk Kim ,  Young-joo Choi

IPC: G01Q70/14 ,  G01Q60/28 ,  H01L21/67 ,  G01Q60/42 ,  H01L27/108

Abstract: A method of forming a micropattern, a substrate surface inspection apparatus, a cantilever set for an atomic force microscope, and a method of analyzing a surface of a semiconductor substrate, and a probe tip the method including forming pinning patterns on a semiconductor substrate; forming a neutral pattern layer in spaces between the pinning patterns; and inspecting a surface of a guide layer that includes the pinning patterns and the neutral pattern layer by using an atomic force microscope (AFM).

公开(公告)号：US09653294B2

公开(公告)日：2017-05-16

申请号：US14957777

申请日：2015-12-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-sung Kim ,  Dae-yong Kang ,  Seung-chul Kwon ,  Shi-yong Yi

IPC: H01L21/302 ,  H01L21/033 ,  H01L21/308 ,  H01L21/311 ,  H01L21/3213 ,  H01L27/108

CPC classification number: H01L21/0337 ,  H01L21/0332 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139 ,  H01L27/10855

Abstract: The present inventive concept provides a method of forming a fine pattern including forming a plurality of pillar-shaped guides that are regularly arranged on a feature layer.