公开(公告)号：US09653294B2

公开(公告)日：2017-05-16

申请号：US14957777

申请日：2015-12-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-sung Kim ,  Dae-yong Kang ,  Seung-chul Kwon ,  Shi-yong Yi

IPC: H01L21/302 ,  H01L21/033 ,  H01L21/308 ,  H01L21/311 ,  H01L21/3213 ,  H01L27/108

CPC classification number: H01L21/0337 ,  H01L21/0332 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139 ,  H01L27/10855

Abstract: The present inventive concept provides a method of forming a fine pattern including forming a plurality of pillar-shaped guides that are regularly arranged on a feature layer.