Plasma Equipment and Method of Dry-Cleaning the Same
    3.
    发明申请
    Plasma Equipment and Method of Dry-Cleaning the Same 审中-公开
    等离子体设备及其干洗方法

    公开(公告)号:US20140209243A1

    公开(公告)日:2014-07-31

    申请号:US14163208

    申请日:2014-01-24

    CPC classification number: H01J37/32091 H01J37/3266 H01J37/32697

    Abstract: A plasma equipment includes a chamber, a shower head disposed in an upper part of an inner space of the chamber for discharging a cleaning gas into the chamber, a plasma generator for generating a plasma gas from the cleaning gas, a lower electrode disposed in a lower part of the inner space of the chamber, a chuck covering the lower electrode, and a field inducing unit disposed outside the chamber for inducing an electric field or a magnetic field within the chamber in a direction parallel to top surfaces of the chuck and the lower electrode. The field inducing unit concentrates the plasma gas on an inner sidewall of the chamber and protects the chuck from the plasma gas.

    Abstract translation: 等离子体设备包括:室,设置在室的内部空间的上部的淋浴喷头,用于将清洁气体排放到室中;等离子体发生器,用于从清洁气体产生等离子体气体;下电极, 室的内部空间的下部,覆盖下部电极的卡盘以及设置在腔室外部的场诱导单元,用于在平行于卡盘的顶面的方向上感应腔室内的电场或磁场, 下电极。 场诱导单元将等离子体气体集中在室的内侧壁上,并保护卡盘免受等离子体气体的影响。

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