专利检索 ap:("Samsung Electronics Co., Ltd.") AND inv:"Sanghoon Woo" 第 1 页

1.

发明授权
Block copolymer and method of manufacturing integrated circuit device using the same 有权

公开(公告)号：US10138318B2

公开(公告)日：2018-11-27

申请号：US15225201

申请日：2016-08-01

申请人： Samsung Electronics Co., Ltd.

发明人： Seungchul Kwon , Jeongju Park , Shi-yong Yi , Eun Sung Kim , Kyeongmi Lee , Joona Bang , Sanghoon Woo

IPC分类号： C08F12/20 , C08F293/00 , H01L21/027 , G03F7/00 , B82Y40/00

摘要： A block copolymer includes a first polymer block and a second polymer block having different structures, and one of the first polymer block and the second polymer block has a halogen-substituted structure.