公开(公告)号：US09941114B2

公开(公告)日：2018-04-10

申请号：US14611691

申请日：2015-02-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Youn-Joung Cho ,  Youn-Soo Kim ,  Sang-Jun Yim ,  Myong-Woon Kim ,  Sang-Ick Lee ,  Sang-Chul Youn

IPC: H01L21/02 ,  H01L23/00 ,  C07F7/00 ,  H01L23/29 ,  H01L23/31 ,  C23C16/40 ,  C23C16/455 ,  H01L49/02

CPC classification number: H01L21/0228 ,  C07F7/003 ,  C23C16/405 ,  C23C16/45553 ,  H01L21/02189 ,  H01L23/291 ,  H01L23/3171 ,  H01L28/40 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An organometallic precursor is represented by a chemical formula of Xn(M)(R1)m(R2)k. M is a central metal. X is a ligand of M and one of 6,6-dimethylfulvenyl, indenyl, cyclopentadienyl and cyclopentadienyl substituted with an amino group. R1 and R2 are ligands of M, and each independently an amino group or an ethylenediamino group. Each n, m and k is a positive integer, and a sum of n, m and k is equal to 3 or 4.