公开(公告)号：US09887078B2

公开(公告)日：2018-02-06

申请号：US14983530

申请日：2015-12-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Namsuk Kim ,  Ohhyung Kwon ,  Dae-Sung Kim ,  Jutaek Lim ,  Jaehyung Jung

IPC: B08B3/00 ,  H01L21/02 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/0209 ,  H01L21/02041 ,  H01L21/02057 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/68792

Abstract: A single-wafer-type cleaning apparatus is provided. The single-wafer-type cleaning apparatus is configured to be capable of controlling electrostatic charges generated due to rotating a wafer during a semiconductor cleaning process and a defect caused by the electrostatic charges. The cleaning process uses an ionizer mounted on a chuck.