公开(公告)号：US20240312765A1

公开(公告)日：2024-09-19

申请号：US18599825

申请日：2024-03-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyung Min LEE ,  Myung Jae YOO ,  Sung-Yeol KIM ,  Sang Yeol PARK ,  Sung Yong LIM ,  Eun Suk LIM ,  Min Ju JEONG ,  Yong Won CHO

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/3299 ,  H01J2237/24564

Abstract: A substrate processing apparatus including the controller are provided. The controller includes: a signal analyzer configured to detect at least one of an amplitude, phase, and frequency of a first signal, which is provided to a chamber; a radio frequency (RF) signal generator configured to generate an RF signal with a natural frequency based on a power of the first signal; a harmonic controller configured to generate a second signal based on the power of the first signal and at least one of the amplitude, phase, and frequency of the first signal, the second signal having a different amplitude, a different phase, and/or a different frequency from the RF signal; an operator configured to perform an operation on the RF signal and the second signal; and a filter configured to generate an RF control signal by filtering an output signal of the operator.