公开(公告)号：US09899565B2

公开(公告)日：2018-02-20

申请号：US15183869

申请日：2016-06-16

申请人： Samsung Electronics Co., Ltd.

发明人： Young Jo Tak ,  Sam Mook Kang ,  Mi Hyun Kim ,  Jun Youn Kim ,  Young Soo Park ,  Misaichi Takeuchi

IPC分类号： H01L33/00 ,  H01L21/683 ,  H01L21/306 ,  H01L21/78 ,  H01L21/02

CPC分类号： H01L33/0075 ,  H01L21/02005 ,  H01L21/02381 ,  H01L21/02458 ,  H01L21/02502 ,  H01L21/0254 ,  H01L21/0262 ,  H01L21/02664 ,  H01L21/30604 ,  H01L21/6835 ,  H01L21/7806 ,  H01L33/0066 ,  H01L33/0079

摘要： A method of manufacturing a semiconductor substrate may include forming a first semiconductor layer on a growth substrate, forming a second semiconductor layer on the first semiconductor layer, forming a plurality of voids in the first semiconductor layer by removing portions of the first semiconductor layer that are exposed by a plurality of trenches in the second semiconductor layer, forming a third semiconductor layer on the second semiconductor layer and covering the plurality of trenches, and separating the second and third semiconductor layers from the growth substrate. on the first semiconductor layer. The third semiconductor layer are grown from the second semiconductor layer and extend above the second semiconductor layer.