SEMICONDUCTOR PACKAGE MARK INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

    公开(公告)号:US20250124565A1

    公开(公告)日:2025-04-17

    申请号:US18667687

    申请日:2024-05-17

    Abstract: Provided is a mark inspection method of a semiconductor package. The method includes receiving a measured image of a semiconductor package comprising a mark including at least one of a figure and a character string, receiving a standard defect image corresponding to the measured image, the standard defect image includes the mark having a defect comprising at least one of misprinting, cutting, blur, noise, displacement, double printing, reverse printing, bay, and thermochromic phenomena, generating a fake image through a deep learning model using a generative adversarial network (GAN) with the measured image and the standard defect image, and comparing the fake image with the measured image.

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