METHOD OF OPTIMIZING OVERLAY MEASUREMENT CONDITION AND OVERLAY MEASUREMENT METHOD USING OVERLAY MEASUREMENT CONDITION

    公开(公告)号:US20250012736A1

    公开(公告)日:2025-01-09

    申请号:US18662244

    申请日:2024-05-13

    Abstract: A method of optimizing an overlay measurement condition includes measuring, for each overlay measurement condition of multiple overlay measurement conditions, an overlay at multiple positions on a substrate; calculating, for each of the multiple overlay measurement conditions, key parameter indexes (KPIs) based on the measured overlay; converting, for each of the multiple overlay measurement conditions, the KPIs into key parameter function (KPF) values based on a KPF, where each of the KPFs has a same dimensional representation; integrating, for each of the multiple overlay measurement conditions, the KPF values to generate an integrated KPF value; and selecting an optimized overlay measurement condition from among the multiple overlay measurement conditions based on the integrated KPF values associated with each of the multiple overlay measurement conditions.

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