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公开(公告)号：US20210188320A1
公开(公告)日：2021-06-24
申请号：US17057538
申请日：2019-05-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jinseob KIM , Hun LEE , Jinsung KIM
Abstract: The disclosure relates to a method of estimating a location of an object and an apparatus therefor. According to an embodiment of the disclosure, an object location estimation apparatus, when a call request to an object is received from a terminal, initiates driving along a driving path, receives signals from the object during driving along the driving path, determines a distance to the object based on the signals from the object, and when the signals from the object are received the preset number of times or more during driving, estimates the location of the object based on the distance to the object determined based on each of the signals and a location on the driving path at a time of receiving each signal.
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公开(公告)号：US20220074848A1
公开(公告)日：2022-03-10
申请号：US17204059
申请日：2021-03-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Yasuhiro HIDAKA , Mitsunori NUMATA , Wookrae KIM , Jinseob KIM , Myungjun LEE
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US20230186460A1
公开(公告)日：2023-06-15
申请号：US18060830
申请日：2022-12-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Myungjun LEE , Jinseob KIM , Wookrae KIM , Jinyong KIM , Jaehwang JUNG , Sungho JANG
CPC classification number: G06T7/001 , H04N23/56 , H04N23/10 , H01L27/108
Abstract: A semiconductor measurement device may include an illumination apparatus having a polarizer on a propagation path of light output from a light source; an optical assembly including an objective lens configured to allow light passing through the polarizer to be incident on a sample and a beam splitter configured to transmit light reflected from the sample to first and second sensors; and a controller. The controller may be configured to determine an alignment state of patterns in a first region of the sample using a first original image output by the first sensor and an alignment state of patterns in a second region of the sample using a second original image output by the second sensor. The first sensor includes a first image sensor and a self-interference generator in a path along which light is incident on the first image sensor. The second sensor includes a second image sensor.
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公开(公告)号：US20250044222A1
公开(公告)日：2025-02-06
申请号：US18767486
申请日：2024-07-09
Applicant: SAMSUNG ELECTRONICS CO., LTD
Inventor： Seungwoo LEE , Jinseob KIM , Jinyong KIM , Taejoong KIM , Jinwoo AHN , Jaehwang JUNG , Taeyong JO , Garam CHOI
Abstract: An image measurement device includes an optical system that transmits light output to an image detection unit, the image detection unit configured to detect the light and generate an image, and an image processing unit that extracts spectral data from the image, wherein the image processing unit generates a profile according to an amount of light for each of a plurality of pixels based on the image, and performs Fourier transform on the profile.
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Patent Agency Ranking
公开(公告)号：US20230204493A1
公开(公告)日：2023-06-29
申请号：US18111229
申请日：2023-02-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Yasuhiro HIDAKA , Mitsunori NUMATA , Wookrae KIM , Jinseob KIM , Myungjun LEE
CPC classification number: G01N21/211 , G01N21/9501 , G02B27/10 , G01N2021/214
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US20250045870A1
公开(公告)日：2025-02-06
申请号：US18766740
申请日：2024-07-09
Applicant: SAMSUNG ELECTRONICS CO., LTD
Inventor： Seungwoo LEE , Jinseob KIM , Jinyong KIM , Taejoong KIM
Abstract: An image measurement device includes an optical system that transmits light output to an image detection unit, the image detection unit configured to detect the light and generate an image, and an image processing unit that extracts spectral data from the image, wherein the image processing unit generates a profile according to an amount of light for each of a plurality of pixels based on the image, and performs Fourier transform on the profile.
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公开(公告)号：US20240230314A9
公开(公告)日：2024-07-11
申请号：US18317395
申请日：2023-05-15
Applicant: Samsung Electronics Co., Ltd.
Inventor： Garam CHOI , Wookrae KIM , Jinseob KIM , Jinyong KIM , Sungho JANG , Younguk JIN , Daehoon HAN
IPC: G01B9/02 , G01B9/02097
CPC classification number: G01B9/02044 , G01B9/02097 , G01B2210/56 , G01B2290/70
Abstract: A semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. The control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. The illumination unit and/or the optical unit may include a polarizer and a compensator having a ¼ wave plate.
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公开(公告)号：US20240133673A1
公开(公告)日：2024-04-25
申请号：US18317395
申请日：2023-05-14
Applicant: Samsung Electronics Co., Ltd.
Inventor： Garam CHOI , Wookrae KIM , Jinseob KIM , Jinyong KIM , Sungho JANG , Younguk JIN , Daehoon HAN
IPC: G01B9/02 , G01B9/02097
CPC classification number: G01B9/02044 , G01B9/02097 , G01B2210/56 , G01B2290/70
Abstract: A semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. The control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. The illumination unit and/or the optical unit may include a polarizer and a compensator having a ¼ wave plate.
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公开(公告)号：US20220005715A1
公开(公告)日：2022-01-06
申请号：US17174731
申请日：2021-02-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun LEE , Changhyeong YOON , Wookrae KIM , Jaehwang JUNG , Jinseob KIM
Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.
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