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1.发明申请公开(公告)号：US20220174806A1
公开(公告)日：2022-06-02
申请号：US17393474
申请日：2021-08-04
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Minseok CHOI , Injae LEE , Inho CHOI , Sungyeol KIM , Sunghyup KIM , Jeonggil KIM , Jongbin PARK
Abstract: A droplet accelerating assembly includes an acceleration chamber extending in a first direction parallel to an ejection direction of the droplet, the acceleration chamber having a first side connected to the droplet generator, a second side opposite the first side in the first direction, the second side including a discharge hole, and a fluid flow path, a pressure controller connected to the fluid flow path of the acceleration chamber, the pressure controller being configured to adjust an internal pressure of the acceleration chamber, an electrifier in the acceleration chamber, the electrifier being configured to electrify the droplet ejected by the droplet generator into an electrified droplet, and an accelerator in the acceleration chamber, the accelerator being configured to accelerate the electrified droplet.
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公开(公告)号：US20210153332A1
公开(公告)日：2021-05-20
申请号：US16990059
申请日：2020-08-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Injae LEE , Sunghyup KIM , Jeonggil KIM , Jinyong KIM , Hyuck SHIN , Sungho JANG , Inho CHOI
Abstract: A droplet generator for extreme ultraviolet (EUV) exposure device includes a nozzle body with an inclined portion, the nozzle body with the inclined portion having a nozzle shape to discharge a target material in a liquid state, a gas supply pipe, at least a portion of the gas supply pipe being in an internal space of the nozzle body and of the inclined portion, and the gas supply pipe to discharge gas toward the target material in the liquid state, a target material supply unit connected to the nozzle body, the target material supply unit including a first valve, a gas supply unit connected to the gas supply pipe, the gas supply unit including a second valve, and a control unit connected to the first and second valves to control a supply amount of the target material and the gas.
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公开(公告)号：US20230144163A1
公开(公告)日：2023-05-11
申请号：US17939293
申请日：2022-09-07
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jongbin PARK , Minseok CHOI , Inho CHOI , Jeonggil KIM
IPC: G03F7/20
CPC classification number: G03F7/70925 , G03F7/7085
Abstract: An apparatus for removing a residue of an EUV light source vessel including an internal side surface having a curved surface is provided. The apparatus includes a frame portion configured to be disposed on a bottom surface of an EUV light source vessel and a head portion above the frame portion. The head portion is configured to be rotatably moved on a circular trajectory while maintaining a desired (and/or alternatively predetermined) distance from the curved surface of the EUV light source vessel. The head portion may have a heating member configured to emit heat toward the curved surface of the EUV light source vessel. The heating member may have a shape curved in an arc corresponding to a portion of the circular trajectory.
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公开(公告)号：US20230071131A1
公开(公告)日：2023-03-09
申请号：US17709534
申请日：2022-03-31
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hoseok SONG , Sunghyup KIM , Injae LEE , Jeonggil KIM
IPC: G03F7/20
Abstract: A collector mirror for an extreme ultraviolet (EUV) light generator includes a first mirror in a vessel, the vessel being configured to receive a material and a laser beam for generating the EUV light, a second mirror surrounding the first mirror, and a detachable third mirror between the first mirror and the second mirror, the third mirror having an inner diameter that is not smaller than an outer diameter of the first mirror, and an outer diameter that is not larger than an inner diameter of the second mirror.
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5.发明申请公开(公告)号：US20220113642A1
公开(公告)日：2022-04-14
申请号：US17555985
申请日：2021-12-20
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup KIM , Ho YU , Jeonggil KIM , Minseok CHOI
Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.
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Patent Agency Ranking
公开(公告)号：US20210116802A1
公开(公告)日：2021-04-22
申请号：US16922328
申请日：2020-07-07
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jinhwan LEE , Jeonggil KIM , Sunghyup KIM
IPC: G03F1/64
Abstract: A pellicle for a reflective mask includes a pellicle body, a pellicle frame below the pellicle body to support the pellicle body, and a pattern structure in at least a part of a surface of the pellicle body, wherein the pattern structure includes a plurality of patterns.
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公开(公告)号：US20250107190A1
公开(公告)日：2025-03-27
申请号：US18652010
申请日：2024-05-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jonggu LEE , Hyeonjin KIM , Kyungwon KANG , Hyunjae KANG , Youngha KIM , Jeonggil KIM , Jinman KIM , Sunghyup KIM , Sanghoon LEE
IPC: H01L29/04 , H01L23/00 , H01L23/498
Abstract: A semiconductor device may include a first semiconductor structure including a first device layer on an upper surface of a first substrate structure, the first device layer including a first region of the semiconductor device; and a second semiconductor structure including a second device layer on a lower surface of a second substrate structure, the second device layer connected to the first device layer and including a second region of the semiconductor device. The first substrate structure may include a first wafer and a second wafer on the first wafer. The second wafer may be in contact with the first device layer. The second substrate structure may include a third wafer and a fourth wafer on a lower surface of the third wafer. The fourth wafer may be in contact with the second device layer. An upper surface of the second wafer may be a (100) crystal plane.
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公开(公告)号：US20250081320A1
公开(公告)日：2025-03-06
申请号：US18638916
申请日：2024-04-18
Applicant: Samsung Electronics Co., Ltd.
Inventor： Injae LEE , Ohkug KWON , Youngduk SUH , Sunghyup KIM , Jeonggil KIM , Yebin NAM , Daegeun YOON , Seungpyo HONG
Abstract: An extreme ultraviolet (EUV) light generating device includes a vessel having an internal space, a droplet generator generating droplets to be supplied to the internal space, a droplet emitter emitting the droplets generated by the droplet generator to the internal space, a laser light source generating a laser beam to generate EUV light by reaction with the droplets, a condensing mirror adjacent to the laser light source to at least partially surround the laser light source and concentrating EUV light on an intermediate focus (IF), and gas lock nozzles around the IF to respectively constitute rows and ejecting a flow control gas to the internal space, wherein a tilted direction of a gas lock nozzle in at least one of the rows is tilted in a direction consistent with a tilted direction of a sidewall of the vessel with respect to a central axis direction of the internal space.
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9.发明公开公开(公告)号：US20230185207A1
公开(公告)日：2023-06-15
申请号：US18164835
申请日：2023-02-06
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup KIM , Ho YU , Jeonggil KIM , Minseok CHOI
CPC classification number: G03F7/70916 , G03F7/70033 , H05G2/008 , G21K1/06 , H05G2/005 , G03F7/70891
Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.
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10.发明申请公开(公告)号：US20210059035A1
公开(公告)日：2021-02-25
申请号：US16835708
申请日：2020-03-31
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup KIM , Ho YU , Jeonggil KIM , Minseok CHOI
Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.
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