公开(公告)号：US20170124695A1

公开(公告)日：2017-05-04

申请号：US15211331

申请日：2016-07-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sangok SEOK ,  Il-Hyoung LEE ,  Byeong-Hwan JEON

IPC: G06T7/00 ,  G06T1/20 ,  H04N5/225

CPC classification number: G06T7/0004 ,  G06T1/20 ,  G06T2207/10141 ,  G06T2207/30148 ,  H04N5/2258

Abstract: Provided are a data processing apparatus and a substrate inspection method. The data processing apparatus includes a first sensing unit which generates first data about a target, a second sensing unit which generates second data about the target, a splitter unit which receives and synchronizes the first data and the second data and outputs m pieces of copied data by copying the synchronized data, and a processing unit which receives and processes any one of the m pieces of copied data, wherein the second data has a time difference with the first data, and m is a natural number of two or more.