公开(公告)号：US20230418260A1

公开(公告)日：2023-12-28

申请号：US18106091

申请日：2023-02-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sangchul Yeo ,  Jaewon Yang ,  Hyeok Lee

IPC: G05B19/4099 ,  G05B13/02

CPC classification number: G05B19/4099 ,  G05B2219/45028 ,  G05B13/0265

Abstract: A reliable lithography model generating method reflecting a mask bias variation and a mask manufacturing method including the lithography model generating method are provided. The lithography model generating method includes preparing basic image data for learning, preparing transform image data that indicates a mask bias variation, generating a lithography model by performing deep learning by combining the basic image data and the transform image data, and verifying the lithography model.

公开(公告)号：US20230177815A1

公开(公告)日：2023-06-08

申请号：US17820911

申请日：2022-08-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sangchul Yeo ,  Jaewon Yang ,  Hyeok Lee ,  Sooryong Lee

IPC: G06V10/776 ,  G06T3/60 ,  G06V10/774

CPC classification number: G06V10/776 ,  G06T3/60 ,  G06V10/774

Abstract: A method of training a semiconductor process image generator includes training the semiconductor process image generator with a plurality of mask images including a first group and a second group, training the semiconductor process image generator with the second group and a first transformed group obtained by applying a transformation to the first group, and training the semiconductor process image generator with the first group and a second transformed group obtained by applying a transformation to the second group.

公开(公告)号：US12299869B2

公开(公告)日：2025-05-13

申请号：US17849617

申请日：2022-06-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyeok Lee ,  Jaewon Yang ,  Sangchul Yeo ,  Eunju Kim ,  Sooryong Lee

IPC: G06T19/00 ,  A61B6/00 ,  A61B6/02 ,  G06F3/04815 ,  G06F3/04842 ,  G06F30/27 ,  G06T7/00 ,  G06V10/10 ,  G06V10/46

Abstract: An operating method of a computing device for predicting a profile using deep learning includes sampling a unique pattern in a full chip, extracting a contour of a resist profile of each of a plurality of heights by performing rigorous simulation corresponding to the unique pattern, preparing an input image and an output image corresponding to the contour of each of the plurality of heights, performing deep learning on the extracted contour using the input image and the output image, and generating a profile prediction model according to performing of the deep leaning.

公开(公告)号：US20230196545A1

公开(公告)日：2023-06-22

申请号：US17849617

申请日：2022-06-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyeok Lee ,  Jaewon Yang ,  Sangchul Yeo ,  Eunju Kim ,  Sooryong Lee

IPC: G06T7/00 ,  G06V10/46 ,  G06V10/10 ,  G06F30/27

CPC classification number: G06T7/0006 ,  G06V10/46 ,  G06V10/10 ,  G06F30/27 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: An operating method of a computing device for predicting a profile using deep learning includes sampling a unique pattern in a full chip, extracting a contour of a resist profile of each of a plurality of heights by performing rigorous simulation corresponding to the unique pattern, preparing an input image and an output image corresponding to the contour of each of the plurality of heights, performing deep learning on the extracted contour using the input image and the output image, and generating a profile prediction model according to performing of the deep leaning.