Integrated circuit device and method of manufacturing the same

    公开(公告)号:US09899323B2

    公开(公告)日:2018-02-20

    申请号:US15377723

    申请日:2016-12-13

    CPC classification number: H01L23/5283 H01L24/09

    Abstract: An integrated circuit device includes a first conductive line and a second conductive line that are spaced apart from each other and extend in a first direction to be parallel to each other; and a contact pad including a pad body including a first branch portion from which the first conductive line branches and a second branch portion from which the second conductive line branches and a loop branch portion that is located between the first branch portion and the second branch portion and protrudes from the pad body. Related devices and fabrication methods are also discussed.

    INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20170309568A1

    公开(公告)日:2017-10-26

    申请号:US15377723

    申请日:2016-12-13

    CPC classification number: H01L23/5283 H01L24/09

    Abstract: An integrated circuit device includes a first conductive line and a second conductive line that are spaced apart from each other and extend in a first direction to be parallel to each other; and a contact pad including a pad body including a first branch portion from which the first conductive line branches and a second branch portion from which the second conductive line branches and a loop branch portion that is located between the first branch portion and the second branch portion and protrudes from the pad body. Related devices and fabrication methods are also discussed.

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