公开(公告)号：US09151962B2

公开(公告)日：2015-10-06

申请号：US13773736

申请日：2013-02-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyun Jae Lee ,  Myoung Ki Ahn ,  Kwang Soo Kim ,  In Ho Seo ,  Chang Hoon Choi

IPC: G02B27/40 ,  G02B7/38 ,  G02B3/10

CPC classification number: G02B27/40 ,  G02B3/10 ,  G02B7/38

Abstract: An autofocus control apparatus includes a beam splitter, a condenser lens and a detector. The beam splitter directs light beams from a light source toward a sample and passes light beams reflected from the sample to the condenser lens. The condenser lens condenses the light beams, and the detector detects a focal point deviation of the sample relative to a focal point of the condenser lens. The focal point deviation is detected based on an intersection of a focal line passing through different focal points of the condenser lens and a light receiving plane configured to receive the light beams passing through the condenser lens.

Abstract translation: 自动对焦控制装置包括分束器，聚光透镜和检测器。 分束器将来自光源的光束引向样品，并将从样品反射的光束传递到聚光透镜。 聚光透镜冷凝光束，并且检测器检测样品相对于聚光透镜的焦点的焦点偏差。 基于通过聚光透镜的不同焦点的焦点线和被配置为接收通过聚光透镜的光束的受光面的交点，检测焦点偏差。

公开(公告)号：US10724967B2

公开(公告)日：2020-07-28

申请号：US16242088

申请日：2019-01-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Myung Ho Jung ,  Young Su Ryu ,  Sung Chai Kim ,  Jong Su Kim ,  Won Guk Seo ,  Chang Hoon Choi ,  Jeong Su Ha

IPC: G01N21/00 ,  G01N21/956 ,  G06T7/00 ,  G01N21/95 ,  H01L21/67 ,  H01L21/677 ,  G06T7/11

Abstract: An inspection apparatus for a semiconductor process and a semiconductor process device, the inspection apparatus including a transferer configured to transfer a process object between a plurality of chambers; at least one line camera installed above the transferer, the at least one line camera being configured to generate an original image by capturing an image of the process object transferred by the transferer; and a controller configured to receive the original image and to perform an inspection of the process object by correcting distortion of the original image due to a change in transfer speed of the transferer.

公开(公告)号：US20140002829A1

公开(公告)日：2014-01-02

申请号：US13927843

申请日：2013-06-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kwang Soo KIM ,  Hyun Jae Lee ,  Byeong Hwan Jeon ,  Chang Hoon Choi

IPC: G01B11/28

CPC classification number: G01B11/00 ,  G01B11/24 ,  G01B11/28 ,  G01B2210/56

Abstract: According to example embodiments, an optical measurement apparatus may include: a station configured to support a measurement target; an image acquisition unit configured to acquire a one-dimensional (1D) line image of the measurement target; a driver configured to move the station and the image acquisition unit; and a controller. The controller may be configured to control the driver and the image acquisition unit to acquire a plurality of 1D line images of the measurement target while varying a distance between the image acquisition unit and the measurement target to generate a two-dimensional (2D) scan image from combining the plurality of 1D line images; and to detect a pattern of the measurement target based on comparing a plurality of 2D reference images and the 2D scan image. The optical measurement apparatus may measure critical dimensions of non-repeating ultrafine patterns at high speed.

Abstract translation: 根据示例实施例，光学测量装置可以包括：被配置为支持测量目标的站; 图像获取单元，被配置为获取所述测量对象的一维（1D）线图像; 驱动器，被配置为移动所述站和所述图像获取单元; 和控制器。 控制器可以被配置为控制驱动器和图像获取单元，以在改变图像获取单元和测量对象之间的距离的同时获取测量对象的多个1D线图像，以生成二维（2D）扫描图像 从组合多个1D线图像; 并且基于比较多个2D参考图像和2D扫描图像来检测测量对象的图案。 光学测量装置可以高速度地测量非重复超细纹图案的临界尺寸。