公开(公告)号：US20150044482A1

公开(公告)日：2015-02-12

申请号：US14450739

申请日：2014-08-04

Applicant: SAMSUNG DISPLAY CO., LTD. ,  DON CO., LTD.

Inventor： Sang-Wook LEE ,  Chung-Soo HA ,  Jong-Kap JO ,  Jin-Ho CHO ,  Do-Hyun SHIN

IPC: C03C17/34

CPC classification number: C03C17/3417 ,  C03C17/42 ,  C03C2217/734 ,  C03C2217/76 ,  G02B1/115

Abstract: An optical coating structure includes a substrate, an anti-reflective coating layer, a base coating layer, an antibacterial coating layer, and a protective coating layer. The anti-reflective coating layer is disposed on the substrate. The anti-reflective coating layer covers the substrate. The base coating layer covers the anti-reflective coating layer. The antibacterial coating layer is disposed on the base coating layer, and the antibacterial coating layer is an interlayer. The protective coating layer covers the antibacterial coating layer. A super-hydrophobic coating layer or an anti-fingerprint coating layer may cover the protective coating layer.

Abstract translation: 光学涂层结构包括基板，抗反射涂层，基底涂层，抗菌涂层和保护涂层。 抗反射涂层设置在基板上。 抗反射涂层覆盖基板。 基底涂层覆盖抗反射涂层。 抗菌涂层设置在基底涂层上，抗菌涂层是中间层。 保护涂层覆盖抗菌涂层。 超疏水涂层或防指纹涂层可覆盖保护涂层。

公开(公告)号：US20150021592A1

公开(公告)日：2015-01-22

申请号：US14249525

申请日：2014-04-10

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Seong SEO ,  Sung-Hoon YANG ,  Tae-Young AHN ,  Sang-Wook LEE ,  Jung-Yun JO ,  Heon-Sik HA ,  Jin-Ho HWANG ,  Kyung-Tea PARK ,  Jun-Mo IM

IPC: H01L27/12

CPC classification number: H01L29/7869 ,  H01L29/66969

Abstract: A method of manufacturing a display substrate includes forming a gate electrode on a base substrate, forming an active pattern which includes an oxide semiconductor and overlaps with the gate electrode, forming an etch stopper which partially covers the active pattern, and performing a plasma treatment process to promote a reduction reaction to portions of the active pattern exposed by the etch stopper, thereby forming a source electrode and a drain electrode.

Abstract translation: 制造显示基板的方法包括在基底基板上形成栅电极，形成包括氧化物半导体并与栅电极重叠的有源图案，形成部分覆盖有源图案的蚀刻停止层，以及进行等离子体处理工艺 以促进对由蚀刻停止件暴露的有源图案的部分的还原反应，从而形成源电极和漏电极。