APPARATUS FOR AND METHOD OF CRYSTALLIZING ACTIVE LAYER OF THIN FILM TRANSISTOR
    2.
    发明申请
    APPARATUS FOR AND METHOD OF CRYSTALLIZING ACTIVE LAYER OF THIN FILM TRANSISTOR 有权
    薄膜晶体管活性层的结晶和结晶方法

    公开(公告)号:US20150348782A1

    公开(公告)日:2015-12-03

    申请号:US14600113

    申请日:2015-01-20

    Abstract: An apparatus for crystallizing an active layer of a thin film transistor, the apparatus includes a first laser irradiating a first beam toward a substrate, an amorphous layer on the substrate being crystallizable into the active layer of the thin film transistor by the first beam, and a second laser irradiating a second beam toward the substrate to heat the active layer, the second beam having an asymmetric intensity profile in a scanning direction of the first and second beams.

    Abstract translation: 一种用于使薄膜晶体管的有源层结晶的装置,该装置包括:向基板照射第一光束的第一激光器,基板上的非晶层通过第一光束可结晶到薄膜晶体管的有源层中;以及 将第二光束照射到所述基板以加热所述有源层的第二激光器,所述第二光束在所述第一和第二光束的扫描方向上具有不对称的强度分布。

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