公开(公告)号：US20240175115A1

公开(公告)日：2024-05-30

申请号：US18466941

申请日：2023-09-14

Applicant: Samsung Display Co., LTD.

Inventor： SEUNGPYO HONG ,  DONGJIN HA

IPC: C23C14/04 ,  C23C14/24

CPC classification number: C23C14/042 ,  C23C14/24 ,  H10K59/10

Abstract: A deposition mask for forming a pattern on a substrate to be deposited, includes a first portion having an upper surface, a second portion having an upper surface half-etched to a first depth from the upper surface of the first portion, and a third portion having an upper surface half-etched to a second depth from the upper surface of the second portion. The third portion defines an opening corresponding to the pattern, and an upper surface of the third portion includes a plane perpendicular to a thickness direction of the deposition mask.

公开(公告)号：US20240139911A1

公开(公告)日：2024-05-02

申请号：US18384141

申请日：2023-10-26

Applicant: Samsung Display Co., LTD.

Inventor： JUNHEE BAE ,  JINSOO SHIN ,  HYUNHEE LEE ,  SEUNGPYO HONG

IPC: B24D3/20 ,  B24D3/34

CPC classification number: B24D3/20 ,  B24D3/34

Abstract: A polishing apparatus includes a shank including a rotation shaft extending in a first direction, a first cushion unit covering a side surface of the shank and having a first hardness, a first film unit adjacent to the first cushion unit in a second direction crossing the first direction and covering a side surface of the first cushion unit, a second cushion unit disposed below the shank, having a second hardness different from the first hardness, and including a first part and a second part. The first part has a cylindrical shape and the second part is disposed below the first part and has a conical shape protruding in a direction opposite to the first part, and a second film unit covering the second part.

公开(公告)号：US20240065085A1

公开(公告)日：2024-02-22

申请号：US18318828

申请日：2023-05-17

Applicant: Samsung Display Co., Ltd.

Inventor： SEUNGPYO HONG ,  HANUL KWEN

IPC: H10K71/16 ,  H10K59/12 ,  C23C14/04 ,  C23C16/04

CPC classification number: H10K71/166 ,  H10K59/1201 ,  H10K71/164 ,  C23C14/042 ,  C23C16/042

Abstract: A mask including a base sheet and at least one protrusion. The base sheet includes a first surface on which a target substrate is seated, a second surface that faces the first surface, and an inside surface portion that defines an opening formed through the first surface and the second surface. The at least one protrusion extends from a selected inside surface of the inside surface toward the opening, in a first region of the base sheet. The at least one protrusion includes a stepped surface. A gap between the stepped surface and the target substrate is greater than a gap between the first surface and the target substrate. The at least one protrusion is not provided extending from a non-selected inside surface of the inside surface portion in a second region of the base sheet.