公开(公告)号：US20240175115A1

公开(公告)日：2024-05-30

申请号：US18466941

申请日：2023-09-14

Applicant: Samsung Display Co., LTD.

Inventor： SEUNGPYO HONG ,  DONGJIN HA

IPC: C23C14/04 ,  C23C14/24

CPC classification number: C23C14/042 ,  C23C14/24 ,  H10K59/10

Abstract: A deposition mask for forming a pattern on a substrate to be deposited, includes a first portion having an upper surface, a second portion having an upper surface half-etched to a first depth from the upper surface of the first portion, and a third portion having an upper surface half-etched to a second depth from the upper surface of the second portion. The third portion defines an opening corresponding to the pattern, and an upper surface of the third portion includes a plane perpendicular to a thickness direction of the deposition mask.