DEPOSITION APPARATUS
    2.
    发明公开

    公开(公告)号:US20240141475A1

    公开(公告)日:2024-05-02

    申请号:US18230860

    申请日:2023-08-07

    CPC classification number: C23C14/26 C23C14/042

    Abstract: A deposition apparatus includes a chamber providing an inner space and a deposition source including an accommodation module accommodating a deposition material and a heater module providing heat to the deposition material. The deposition source is accommodated in the inner space to provide the deposition material. The heater module includes a first heater cover including a surface facing the accommodation module, including an insulating material, and provided with a first through hole, a second heater cover including an insulating material and provided with a second through hole, a heater disposed between the first and second heater covers, a fixing frame coupled with the second heater cover to fix the second heater cover and provided with a fastening hole, a coupling member inserted into the first and second through holes and the fastening hole, and a shielding cover covering an end of the coupling member and including an insulating material.

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