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公开(公告)号:US11114472B2
公开(公告)日:2021-09-07
申请号:US16653916
申请日:2019-10-15
Applicant: Samsung Display Co., Ltd.
Inventor: Byeong Beom Kim , Heon Sik Ha , Jin Ho Hwang
IPC: H01L27/12
Abstract: A transistor panel may include a substrate, a transistor, a first inorganic buffer layer, and an inorganic fluorine-containing buffer layer. The transistor may overlap the substrate and may include a semiconductor layer. The first inorganic buffer layer may be disposed between the substrate and the semiconductor layer. The inorganic fluorine-containing buffer layer may be disposed between the first inorganic buffer layer and the semiconductor layer and may contain fluorine in a range of 0.5 at % to 2 at %.
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公开(公告)号:US10825880B2
公开(公告)日:2020-11-03
申请号:US16143934
申请日:2018-09-27
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Jin Ho Hwang , Byeong-Beom Kim , Chul Min Bae , Woo-Seok Jeon
IPC: H01L27/32 , G09G3/32 , G09G3/3225 , G09G3/3233
Abstract: A display device includes: a substrate; a semiconductor on the substrate and including a driving channel; a first insulating layer on the semiconductor; a driving gate electrode on the first insulating layer and overlapping the driving channel; a second insulating layer on the driving gate electrode and the first insulating layer and including first and second dielectric constant layers, the second dielectric constant layer having a dielectric constant that is greater than that of the first dielectric constant layer; a storage electrode on the second insulating layer; a passivation layer covering the storage electrode and the second insulating layer; a pixel electrode on the passivation layer; an emission member on the pixel electrode; and a common electrode on the emission member, wherein the storage electrode overlaps the driving gate electrode, and wherein the storage electrode, the driving gate electrode and the second insulating layer therebetween form a storage capacitor.
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公开(公告)号:US09340868B2
公开(公告)日:2016-05-17
申请号:US13760758
申请日:2013-02-06
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Jin Ho Hwang , Do-Hyun Kim , Sang Won Shin , Woo Song Kim , Chang-Oh Jeong
CPC classification number: C23C14/352 , C23C14/0063 , C23C14/35 , C23C16/455 , C23C16/45565 , H01J37/3244 , H01J37/32449 , H01J37/32834 , H01J37/3411 , H01J37/3417 , H01J37/3435 , H01J37/3438
Abstract: A sputtering device includes: a sputtering target; a substrate supporter facing the sputtering target and upon which a substrate is disposed; an anode mask between the sputtering target and the substrate which is on the substrate supporter; and a gas distribution member between the anode mask and the sputtering target, and including a plurality of gas distribution tubes separated from each other. Each gas distribution tube includes a plurality of discharge holes defined therein and through which gas is discharged to a vacuum chamber configured to receive the sputtering device.
Abstract translation: 溅射装置包括:溅射靶; 面向溅射靶的衬底支撑件,并且衬底被设置在衬底支撑件上; 位于所述基板支撑体上的所述溅射靶和所述基板之间的阳极掩模; 以及位于阳极掩模和溅射靶之间的气体分配构件,并且包括彼此分离的多个气体分配管。 每个气体分配管包括限定在其中的多个排放孔,并且气体被排出到被配置为接收溅射装置的真空室。
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