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    DONOR SUBSTRATE AND METHOD OF FORMING TRANSFER PATTERN USING THE SAME
    1.
    发明申请
    DONOR SUBSTRATE AND METHOD OF FORMING TRANSFER PATTERN USING THE SAME 有权
    基底和使用其的形成转印图案的方法

    公开(公告)号：US20140357000A1

    公开(公告)日：2014-12-04

    申请号：US14061961

    申请日：2013-10-24

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Joon Gu LEE ,  Won Jong KIM ,  Ji Young CHOUNG ,  Jin Baek CHOI ,  Yeon Hwa LEE ,  Hyunsung BANG ,  Young-Woo SONG

    IPC: H01L51/00 ,  H01L51/56

    CPC classification number: H01L51/0013 ,  B41M5/38207 ,  B41M5/46 ,  B41M2205/06 ,  B41M2205/30 ,  B41M2205/38 ,  C23C14/048

    Abstract: A donor substrate includes a base substrate; a light reflection layer on the base substrate and partially overlapping the base substrate; a light-to-heat conversion layer on the base substrate, and including a combination layer including an insulating material and a first metal material; and a transfer layer on the light-to-heat conversion layer. A ratio of the first metal material in the combination layer to the insulating material in the combination layer increases as a distance from the base substrate increases along a thickness direction of the light-to-heat conversion layer.

    Abstract translation: 供体衬底包括基底; 基底基板上的光反射层，并与基底部分重叠; 基底基板上的光热转换层，并且包括包含绝缘材料和第一金属材料的组合层; 以及在光热转换层上的转印层。 组合层中的第一金属材料与组合层中的绝缘材料的比例随着与基底基板的距离沿着光热转换层的厚度方向增加而增加。

    OPTICAL MASK
    2.
    发明申请
    OPTICAL MASK 有权
    光学面膜

    公开(公告)号：US20160064698A1

    公开(公告)日：2016-03-03

    申请号：US14668587

    申请日：2015-03-25

    Applicant: Samsung Display Co., Ltd.

    Inventor： Joon Gu LEE ,  Yeon Hwa LEE ,  Jin Baek CHOI ,  Young Gil KWON

    IPC: H01L51/56 ,  C23C14/04

    CPC classification number: H01L51/56 ,  B41M5/40 ,  B41M5/42 ,  B41M5/426 ,  B41M5/46 ,  B41M5/48 ,  C23C14/042 ,  H01L51/0013

    Abstract: An optical mask includes a light-to-heat conversion layer with an improved temperature profile. The optical masks may comprise a light-transmitting base substrate; a first reflective pattern layer which is formed on the light-transmitting base substrate comprising a first opening portion transmitting light emitted from under the light-transmitting base substrate and a first reflective portion reflecting the light; a second reflective pattern layer which is formed over the first opening portion comprising a second opening portion overlapping a first area of the first opening portion and a second reflective portion overlapping a second area of the first opening portion; and a light-to-heat conversion pattern layer which is formed on the light-transmitting base substrate, being disposed in the first area of the first opening portion, absorbing at least a part of the light, and converting the light absorbed into heat.

    Abstract translation: 光学掩模包括具有改进的温度分布的光热转换层。 光掩模可以包括透光基底; 形成在所述透光性基板上的第一反射图案层，具有透射从所述透光性基板下方射出的光的第一开口部和反射所述光的第一反射部; 第二反射图案层，形成在第一开口部分上，包括与第一开口部分的第一区域重叠的第二开口部分和与第一开口部分的第二区域重叠的第二反射部分; 以及形成在所述透光性基底基板上的光热转换图案层，设置在所述第一开口部的所述第一区域中，吸收至少一部分所述光，并将吸收的光转换成热。

    OPTICAL MASK
    3.
    发明申请
    OPTICAL MASK 有权
    光学面膜

    公开(公告)号：US20160062228A1

    公开(公告)日：2016-03-03

    申请号：US14716667

    申请日：2015-05-19

    Applicant: Samsung Display Co., Ltd.

    Inventor： Yeon Hwa LEE ,  Joon Gu LEE ,  Jin Baek CHOI

    IPC: G03F1/54

    CPC classification number: G03F1/54 ,  B41M5/46 ,  B41M5/465 ,  B41M5/48 ,  H01L51/0013

    Abstract: An optical mask including a transmissive base substrate, a reflective pattern layer, and a photothermal conversion pattern layer. The reflective pattern layer is disposed on the transmissive base substrate. The reflective pattern layer includes reflectors. The photothermal conversion pattern layer is disposed on the transmissive base substrate among the reflectors. The photothermal conversion pattern layer includes first regions with a first light absorptivity and second regions with a second light absorptivity. The second light absorptivity is greater than the first light absorptivity. The first regions are disposed among the second regions.

    Abstract translation: 一种光掩模，包括透射基底，反射图案层和光热转换图案层。 反射图案层设置在透射基底上。 反射图案层包括反射器。 光电转换图案层设置在反射器之间的透射基底基板上。 光热转换图案层包括具有第一光吸收率的第一区域和具有第二光吸收率的第二区域。 第二光吸收率大于第一光吸收率。 第一区域设置在第二区域中。

    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
    4.
    发明申请
    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF 有权

    公开(公告)号：US20210159285A1

    公开(公告)日：2021-05-27

    申请号：US17141326

    申请日：2021-01-05

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jin Baek CHOI

    IPC: H01L27/32 ,  H01L51/52 ,  H01L51/56

    Abstract: A display device includes a substrate with a display region and a non-display region. The display region includes first pixels, second pixels, and third pixels. Each of the first to third pixels have emission regions from which light is to be emitted, a light emitting element in the emission region, and a pixel circuit area to drive the light emitting element. A dummy pattern extends through a non-emission region of the substrate located in the display region between adjacent pixels. A thin film encapsulation layer covers the dummy pattern and each of the emission regions.

    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
    6.
    发明申请
    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF 有权

    公开(公告)号：US20240423078A1

    公开(公告)日：2024-12-19

    申请号：US18815132

    申请日：2024-08-26

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jin Baek CHOI

    IPC: H10K59/88 ,  H10K50/824 ,  H10K50/844 ,  H10K59/12 ,  H10K59/122 ,  H10K59/131 ,  H10K59/35 ,  H10K71/00

    Abstract: A display device includes a substrate with a display region and a non-display region. The display region includes first pixels, second pixels, and third pixels. Each of the first to third pixels have emission regions from which light is to be emitted, a light emitting element in the emission region, and a pixel circuit area to drive the light emitting element. A dummy pattern extends through a non-emission region of the substrate located in the display region between adjacent pixels. A thin film encapsulation layer covers the dummy pattern and each of the emission regions.

    ORGANIC LIGHT EMITTING DIODE DISPLAY AND METHOD FOR MANUFACTURING THE SAME
    7.
    发明申请
    ORGANIC LIGHT EMITTING DIODE DISPLAY AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    有机发光二极管显示器及其制造方法

    公开(公告)号：US20150014658A1

    公开(公告)日：2015-01-15

    申请号：US14282154

    申请日：2014-05-20

    Applicant: Samsung Display Co., Ltd.

    Inventor： Ji Young CHOUNG ,  Hyun Sung BANG ,  Joon Gu LEE ,  Jin Baek CHOI ,  Yeon Hwa LEE

    IPC: H01L51/52 ,  H01L51/56

    CPC classification number: H01L51/5203 ,  H01L51/5228 ,  H01L51/5284

    Abstract: Disclosed are an organic light emitting diode display and a method for manufacturing the same. The organic light emitting diode display includes: a driving switching element; a pixel electrode connected with the driving switching element; an auxiliary electrode separated from the pixel electrode and positioned in a same layer as the pixel electrode; an organic common layer positioned on the pixel electrode and the auxiliary electrode and including a contact hole positioned on the auxiliary electrode; and a common electrode positioned on the organic common layer and connected with the auxiliary electrode through the contact hole; and the auxiliary electrode includes a light absorbing layer.

    Abstract translation: 公开了一种有机发光二极管显示器及其制造方法。 有机发光二极管显示器包括：驱动开关元件; 与驱动开关元件连接的像素电极; 辅助电极，与像素电极分离并与像素电极位于同一层; 位于像素电极和辅助电极上并包括位于辅助电极上的接触孔的有机共同层; 以及公共电极，位于有机共同层上，并通过接触孔与辅助电极连接; 并且辅助电极包括光吸收层。

    OPTICAL PATTERNING MASK AND METHOD FOR FABRICATING DISPLAY DEVICE USING THE SAME
    9.
    发明申请
    OPTICAL PATTERNING MASK AND METHOD FOR FABRICATING DISPLAY DEVICE USING THE SAME 有权
    光学图案掩模和使用其制造显示器件的方法

    公开(公告)号：US20160118630A1

    公开(公告)日：2016-04-28

    申请号：US14680054

    申请日：2015-04-06

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jin Baek CHOI ,  Yeon Hwa Lee ,  Joon Gu Lee

    IPC: H01L51/56 ,  H01L51/00

    CPC classification number: H01L51/56 ,  B41M5/40 ,  B41M5/42 ,  B41M5/426 ,  B41M5/46 ,  B41M5/48 ,  H01L51/0013

    Abstract: The optical patterning mask had a protection layer on a light absorption layer. It prevents the light absorption layer from damaged by the cleaning gas when processing the used optical patterning mask for reuse. The protection layer may be made of the same material as bank layer or of material different from the bank layer. The bank layer defines the boundary of the area to be transferred in the transfer layer. The protection layer of the present invention can maintain longer the transfer efficiency of the optical patterning mask, even when the same mask is used repeatedly after cleaning, since the light absorption layer protected from cleaning process can maintain longer its heat conversion property.

    Abstract translation: 光学图案掩模在光吸收层上具有保护层。 当处理所使用的光学图案掩模以重新使用时，防止光吸收层被清洁气体损坏。 保护层可以由与堤层或不同于堤层的材料相同的材料制成。 银行层定义要在转移层中转移的区域的边界。 即使在清洁后重复使用相同的掩模，本发明的保护层可以保持更长的光学图案掩模的转印效率，因为防止清洁过程的光吸收层可以保持其热转换性能更长。

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