知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

11 records (took 0.014 seconds)

    OPTICAL MASK
    1.
    发明申请
    OPTICAL MASK 有权
    光学面膜

    公开(公告)号：US20160064698A1

    公开(公告)日：2016-03-03

    申请号：US14668587

    申请日：2015-03-25

    Applicant: Samsung Display Co., Ltd.

    Inventor： Joon Gu LEE ,  Yeon Hwa LEE ,  Jin Baek CHOI ,  Young Gil KWON

    IPC: H01L51/56 ,  C23C14/04

    CPC classification number: H01L51/56 ,  B41M5/40 ,  B41M5/42 ,  B41M5/426 ,  B41M5/46 ,  B41M5/48 ,  C23C14/042 ,  H01L51/0013

    Abstract: An optical mask includes a light-to-heat conversion layer with an improved temperature profile. The optical masks may comprise a light-transmitting base substrate; a first reflective pattern layer which is formed on the light-transmitting base substrate comprising a first opening portion transmitting light emitted from under the light-transmitting base substrate and a first reflective portion reflecting the light; a second reflective pattern layer which is formed over the first opening portion comprising a second opening portion overlapping a first area of the first opening portion and a second reflective portion overlapping a second area of the first opening portion; and a light-to-heat conversion pattern layer which is formed on the light-transmitting base substrate, being disposed in the first area of the first opening portion, absorbing at least a part of the light, and converting the light absorbed into heat.

    Abstract translation: 光学掩模包括具有改进的温度分布的光热转换层。 光掩模可以包括透光基底; 形成在所述透光性基板上的第一反射图案层，具有透射从所述透光性基板下方射出的光的第一开口部和反射所述光的第一反射部; 第二反射图案层，形成在第一开口部分上，包括与第一开口部分的第一区域重叠的第二开口部分和与第一开口部分的第二区域重叠的第二反射部分; 以及形成在所述透光性基底基板上的光热转换图案层，设置在所述第一开口部的所述第一区域中，吸收至少一部分所述光，并将吸收的光转换成热。

    METHOD OF MANUFACTURING SUBSTRATE OF ORGANIC LIGHT-EMITTING DISPLAY DEVICE
    5.
    发明申请
    METHOD OF MANUFACTURING SUBSTRATE OF ORGANIC LIGHT-EMITTING DISPLAY DEVICE 有权
    制造有机发光显示装置的基板的方法

    公开(公告)号：US20160211451A1

    公开(公告)日：2016-07-21

    申请号：US15082726

    申请日：2016-03-28

    Applicant: Samsung Display Co., Ltd.

    Inventor： Young Gil KWON

    IPC: H01L51/00 ,  H01L27/32 ,  H01L51/56

    CPC classification number: H01L51/0016 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/26 ,  H01L27/3246 ,  H01L27/3283 ,  H01L51/0013 ,  H01L51/5012 ,  H01L51/5056 ,  H01L51/5072 ,  H01L51/5088 ,  H01L51/5092 ,  H01L51/56 ,  H01L2227/323

    Abstract: A method of manufacturing a substrate of an organic light-emitting display device, the method including: forming, on a first surface of a transparent substrate, a photothermal conversion layer configured to covert incident light into thermal energy; forming partition walls on the first surface in a first region of the photothermal conversion layer, the partition walls including a photosensitive compound including a resorcinarene, the resorcinarene including a perfluorocarbon group; forming an organic material layer on the first surface in a second region of the photothermal conversion layer, the second region being defined by the partition walls; removing the partition walls; placing a target substrate over the organic material layer; and applying light to a second surface of the transparent substrate, the second surface being opposite the first surface of the transparent substrate.

    Abstract translation: 一种制造有机发光显示装置的基板的方法，所述方法包括：在透明基板的第一表面上形成被配置为将入射光遮蔽成热能的光热转换层; 在光热转换层的第一区域中的第一表面上形成隔壁，所述隔壁包括包含间苯二酚的光敏化合物，所述间苯二酚包括全氟化碳基团; 在所述光热转换层的第二区域中的所述第一表面上形成有机材料层，所述第二区域由所述隔壁限定; 拆除隔墙; 将目标衬底放置在有机材料层上; 以及将光施加到所述透明基板的第二表面，所述第二表面与所述透明基板的所述第一表面相对。

    OPTICAL PATTERNING MASK AND METHOD OF FABRICATING DISPLAY DEVICE USING THE SAME
    6.
    发明申请
    OPTICAL PATTERNING MASK AND METHOD OF FABRICATING DISPLAY DEVICE USING THE SAME 有权
    光学图案掩模和使用其制造显示器件的方法

    公开(公告)号：US20160043320A1

    公开(公告)日：2016-02-11

    申请号：US14621937

    申请日：2015-02-13

    Applicant: Samsung Display Co., Ltd.

    Inventor： Young Gil KWON

    IPC: H01L51/00 ,  H01L27/32

    CPC classification number: H01L51/0013 ,  B41M5/42 ,  B41M5/426 ,  B41M5/48

    Abstract: An optical patterning mask, including a base substrate, a reflective layer disposed on the base substrate, the reflective layer including a first opening, a shadow pattern disposed on the base substrate and in the first opening, a thermal insulation layer disposed on the base substrate and covering the reflective layer and the shadow pattern, an absorption layer disposed on the thermal insulating layer, a bank layer disposed on the absorption layer, the bank layer including a second opening overlapping the first opening, a thermal conduction prevention pattern disposed on the absorption layer and overlapping the shadow pattern, and a transfer layer disposed on the absorption layer, the bank layer, and the thermal conduction prevention pattern.

    Abstract translation: 一种光学图案掩模，包括基底基板，设置在基底基板上的反射层，反射层包括第一开口，阴影图案，设置在基底基板上和第一开口中，设置在基底基板上的绝热层 并且覆盖反射层和阴影图案，设置在绝热层上的吸收层，设置在吸收层上的堤层，堤层包括与第一开口重叠的第二开口，布置在吸收层上的导热防止图案 并且重叠阴影图案，以及设置在吸收层，堤层和导热防止图案上的转印层。

    DONOR SUBSTRATE
    8.
    发明申请
    DONOR SUBSTRATE 审中-公开
    多晶硅基板

    公开(公告)号：US20160126456A1

    公开(公告)日：2016-05-05

    申请号：US14695405

    申请日：2015-04-24

    Applicant: Samsung Display Co., Ltd.

    Inventor： Young Gil KWON

    IPC: H01L51/00 ,  H01L51/56

    CPC classification number: H01L51/0013 ,  H01L27/3211 ,  H01L51/5265 ,  H01L51/56 ,  H01L2251/558

    Abstract: A donor substrate including: a light-transmitting base substrate; an insulation layer disposed on an upper surface of the light-transmitting base substrate, the insulating layer including: a first area having a first thickness; a second area having a second thickness, the second thickness different from the first thickness; and a third area having a third thickness, the third thickness different from the first thickness and the second thickness; an absorption layer disposed on the insulation layer; and a transfer layer disposed on the absorption layer.

    Abstract translation: 一种供体衬底，包括：透光性基底; 绝缘层，设置在所述透光基底基板的上表面上，所述绝缘层包括：具有第一厚度的第一区域; 具有第二厚度的第二区域，所述第二厚度不同于所述第一厚度; 以及具有第三厚度的第三区域，所述第三厚度不同于所述第一厚度和所述第二厚度; 设置在绝缘层上的吸收层; 以及设置在吸收层上的转印层。

    OPTICAL MASK AND METHOD OF MANUFACTURING THE OPTICAL MASK
    10.
    发明申请
    OPTICAL MASK AND METHOD OF MANUFACTURING THE OPTICAL MASK 审中-公开
    光学掩模和制造光学掩模的方法

    公开(公告)号：US20160070162A1

    公开(公告)日：2016-03-10

    申请号：US14668208

    申请日：2015-03-25

    Applicant: Samsung Display Co., Ltd.

    Inventor： Young Gil KWON

    IPC: G03F1/50 ,  G03F1/76

    CPC classification number: G03F1/50 ,  B41M5/42 ,  B41M5/46 ,  B41M5/48 ,  G03F1/76 ,  G03F7/0005

    Abstract: An optical mask, including: a photothermal conversion layer configured to convert optical energy into thermal energy; and an adiabatic pattern layer disposed on the photothermal conversion layer, wherein the photothermal conversion layer includes a thermal acid generator configured to generate an acid in response to the thermal energy.

    Abstract translation: 一种光掩模，包括：光热转换层，被配置为将光能转换成热能; 以及设置在光热转换层上的绝热图案层，其中光热转换层包括被配置为响应于热能产生酸的热酸发生器。

Patent Agency Ranking